title: Field emission in diode and triode vacuum nanostructures
abstract: The paper discusses the nano-diode and nano-triode structures of vacuum electronics. Such structures may have the dielectric film with the thickness of several nanometers wich is located on the cathode. Such film with a large dielectric constant reduces the thickness of the potential barrier by about film thickness and reduces the height of barrier. The grid electrode structure may contain several periods of metallization with a thickness of tens of nanometers, which allows one to obtain the res
journal: arXiv (Cornell University)