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In our ever-connected world, data is everywhere. But having access to an ever-increasing amount of information has also led to a number of challenges. The possibility of data breaches, with their potentially disastrous consequences, is one increasingly important challenge that businesses need to face.
When you take into account the huge amount of customer data collected and stored on a daily basis in contact centers, it is not surprising to learn that data breaches are the single biggest risk factor in the contact center industry. And although there is no way to 100% guarantee you will avoid a data breach, with thorough preparation it is possible to mitigate the potential risks.
Below, we compiled details of the most important contact center compliance legislation related to data security you should be aware of.
Telephone bank card payments
These days most companies provide customers with the opportunity to make immediate online purchases. However, when it comes to paying online (especially in a post-GDPR world), data security is always a major concern – for both companies and customers.
With that in mind, it’s vitally important for companies that provide real-time telephone-based payment solutions to ensure that the customer data they process while handling card and debit card transactions is completely safe and secure, and in particular is based on PCI DSS regulations.
The PCI DSS certificate, issued by the five largest credit and debit card issuers in the market (Visa, MasterCard, American Express, Discover and JCB), is one of the strictest security standards in the world, and applies to any organization that accepts credit and debit card payments. To be able to begin initiating real-time payments during phone calls your company, or the outsourced call center you rely on, will need to be in possession of the PCI DSS certificate.
Having been the proud holders of the PCI DSS certificate for four consecutive years, we here at VCC Live can confirm that it is the ultimate proof of a solution’s success in keeping its business data safe and secure.
The General Data Protection Regulation (GDPR), which came into force on 25 May 2018, is a regulation that contact centers have no choice but to comply with. Aiming to strengthen data protection across the EU, the regulation gives people more control over how organizations can use their personal data.
GDPR has brought major changes to the business world, and call centers, which usually deal with a huge volume of data, are no exception. It also introduced heavy penalties for organizations that fail to comply with the new legislation.
This legislation requires contact centers to operate in accordance with strict rules, such as making sure customers can easily access their personal data and providing them with the right to be forgotten.
Even though GDPR is now in effect, many organizations are still trying to determine what their obligations are under the new rules (if you’re still unclear whether your call center is GDPR compliant or not, it’s time to check out our GDPR checklist).
Call recording is a common call center practice, with most contact centers recording customer calls for security and training purposes. However, the correct handling and processing of recorded calls can cause (and indeed are causing) headaches for many businesses.
Voice files are considered personal data as they can include personal details, such as the caller’s name, address or financial information. As a result, call recording is classified as a form of ‘data processing’, and falls under the new rules covered by GDPR.
When it comes to call recording the golden rule is that agents will need to specifically request permission from their customers to be able to record calls. Therefore, it is essential to ensure that your staff always pay special attention to obtaining consent from your customers.
In particular, contact centers should never assume that informing customers about call recording is enough to indicate consent. Instead, they need to directly ask customers for permission, while also telling them they can opt out of the call before the conversation continues.
As you can see there are several important rules and regulations contact centers must abide by. And as new rules continue to appear every year, it’s best you always stay prepared by making your organization fully aware of the importance of data security.

domain: law


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So, what'chew been up to?
Yeah I'm kickin' back.
See you later.
You can't get enough Zombies in your life! Check out this fantastic comic by Mark Stokes, who also happens to be a fantastic fellow!
A funny comic about working at a record store and general silliness.
A very interesting and funny comic about little indie boys and people with issues.

domain: artistic


August 9, 2015 8:40:07 am
Oscar-winning actress Meryl Streep’s new movie ‘Ricki & The Flash’ is dedicated to her band’s bassist in the film.
Rick Rosas, who plays Buster opposite the 66-year-old actress’ rocker character Ricki, lost his battle with cancer in November shortly after filming wrapped on the Jonathan Demme project, reported Vanityfair online.
There is a special tribute to him in the credits at the end of the movie.
Born in Los Angeles in 1949, Rosas also worked with Demme on 2006’s ‘Neil Young: Heart of Gold’ documentary.
One of California’s most in-demand session musicians, he also worked with Joe Walsh, Crosby, Stills, Nash & Young, Jerry Lee Lewis, Ron Wood and Etta James.
He was the only bassist to have played in three of Neil Young’s bands – Buffalo Springfield, Crosby, Stills, Nash & Young and Crazy Horse.
The new film has other ties to Neil Young – the rocker taught Streep how to play guitar for the project.
📣 The Indian Express is now on Telegram. Click here to join our channel (@indianexpress) and stay updated with the latest headlines
- The Indian Express website has been rated GREEN for its credibility and trustworthiness by Newsguard, a global service that rates news sources for their journalistic standards.


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Ascent of Little Haystack on 2016-08-19
|Others in Party:||C. Gonyo|
|Date:||Friday, August 19, 2016|
|Ascent Type:||Successful Summit Attained|
| Location:||USA-New York|
| Elevation:||4692 ft / 1430 m|
Ascent Trip ReportStarted from the Graden parking lot, getting the last spot at 6:20am. Hit Haystack mountain in 4 hours from the shortcut going over Little Haystack on the way. Continued back on the ridge trail to Basin Mountain, and up the Cliffs of Saddleback before going down the ore brook trail to JBL and out to the garden lot.
Total time was about 9.5 hours.
|Summary Total Data|
| Total Elevation Gain:||3170 ft / 966 m|
| Route Conditions:||Maintained Trail|
| Gear Used:||Ski Poles|
| Weather:||Pleasant, Calm, Partly Cloudy|
| Gain on way in:||3170 ft / 966 m|
| Route:||Ridge Trail|
| Start Trailhead:||Garden Parking Lot 1522 ft / 463 m|
|Ascent Part of Trip: Upper Great Range|
Complete Trip Sequence:
Total Trip Gain: 3170 ft / 966 m
This page has been served 201 times since 2005-01-15.

domain: geography


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Ishan Kishan’s coach Uttam Mazumdar has highlighted the importance of meditation in the recent success of the 23-year-old wicketkeeper-batsman. Uttam Mazumdar further stated that he wasn’t surprised when Ishan Kishan stepped out to hit a six off the first delivery he faced in ODI cricket.
Ishan Kishan smashed a blistering 59 off 42 balls in his ODI debut, helping India win the first game against Sri Lanka by seven wickets. What stood out was his confidence to hit the first ball he faced in ODI cricket for a six by dancing down the track.
Ishan Kishan Became Fearless Due To Meditation Which He Practiced After IPL 2021 Postponement: Coach Uttam Mazumdar
After the postponement of IPL 2021, Ishan Kishan took to meditating daily for 20 minutes. His coach asked him to envision his best knocks while thinking about his cricketing dreams coming true. Apart from meditation, the Indian youngster also took to practicing yoga for two hours daily under the advice of Uttam Mazumdar.
Speaking during an interaction with Bengali daily Anandabazar Patrika, his coach explained how meditation has made Ishan Kishan completely fearless.
“Since he started meditating, all his fears were gone. Confidence has also increased a lot. He had the skills to start his one-day journey with a six. So I was not surprised after he stepped out against Dhananjay de Silva. He also hit four off the first ball in his Ranji Trophy debut. In this way, he tries to reduce the pressure.”
His coach explained how in modern-day cricket, it is not enough for batters to play just textbook shots as they need to keep the scoring rate up by playing aggressive strokes.
Uttam Mazumdar added: “Cricket has changed a lot now. You have to bat according to the text book and also push your team’s score forward by playing big shots. In the first match, Prithvi and Ishan’s fearless cricket helped the team win with 15 pvers to spare. I would want them to play with a similar approach in the upcoming game as well.”
After his impressive ODI debut, Ishan Kishan revealed that he had already announced in the dressing room that he would try to hit the first ball he faced for a six. Wicket-keeper batsman Ishan Kishan, who made his One Day International debut for India on 18 July, scored a fast 59 off 42 balls against Sri Lanka. Ishan Kishan became the first Indian batsman to attain a half-century in the debut match in both T20 and One Day Internationals.
Ishan Kishan was the top run-getter for Mumbai Indians in the 2020 season, scoring 516 runs at an average of 57.33 while he had an indifferent campaign in IPL 2021 managing just 73 runs from 5 games averaging a dismal 14.6.
Ishan Kishan Told Everyone That Wherever The First Ball Lands, He Will Hit It For A Six Which He Did In Style
Speaking with official broadcaster Sony after the game, Ishan Kishan said that his mind was already made up even before stepping onto the field.
“Actually, everyone knew it, inside also I had already told everyone that once I go, wherever the first ball is, I will hit it for a six. Because the odds were in my favor – birthday plus a good pitch and I was playing my first ODI and I felt I could target him.”
India will be looking to wrap up the series when they take on Sri Lanka in the second ODI in Colombo on the date. Sri Lankan skipper Dasun Shanaka won the toss and elected to bat against India in the second ODI. India fielded an unchanged team in the 2nd ODI while pacer Kasun Rajitha came in for fast bowler Isuru Udana in the Sri Lankan XI.
Sri Lanka was 137/4 as Yuzvendra Chahal accounted for 2 scalps and Bhuvneshwar Kumar and Deepak Chahar picked a wicket apiece. For Sri Lanka, opener Avishka Fernando scored 50.

domain: sports


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Published: July 27, 2003
An article on July 13 about the Hawaiian island of Oahu misidentified a surfing contest held at Waimea Bay. It is the Eddie Aikau Big Wave Invitational. (The Duke Kahanamoku Classic was held at Sunset Beach, also on Oahu.)
A picture caption with the article misidentified a surfer. He was a student, Basil Steele; Stan Van Voorhis is his surfing instructor.

domain: news


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The cholesterol is increased, and there is mg no nitrogen retention. Although there seems to be much evidence that school health work "xr" will be enlarged still more, the medical profession need have no fear that the school is interested in absorbing the work of the practicing physician. Whilst we niight get the evidence elsewhere, it is quite can as well to give weight to these symptoms, and, when observed, to adopt means early for the relief of the brain.
This is a of jjoint which deserves to be kept in mind.
Increased by friction of the surface, as by this means the surface circulation is maintained, how so that a larger amount of blood is brought under the influence of the cooling medium. Numerous small idcers scattered over the mucosa of caecum and colon: 300. The columns of together Goll and the pjTamidal tracts are affected in varying degree throughout their entire course. The same mode of inoculation you produced death with the American form to both microbes; pigeons to both when large quantities of virus are introduced into the system. We have opened a great many, high and in all cases found about the same lesions. For - its course is often irregular and even erratic complicated with and followed by neuralgic symptoms referred to the peripheral or central nervous system, arthritic effusions, painful inflammatory conditions of certain fibrous structures, of a localized nature, or swelling of the testicles." (Hughes.) Three distinct types of the disease are recognized by Hughes: A malignant type, in which the disease may prove fatal within a week or ten days; an undulatory type (the common form), in which the fever is marked by intermittent waves, or undulations, of variable length, separated by periods of apyrexia and absence of symptoms, the duration of this undulatory form being from three months (the average time) to two years, the patient suifering a series of relapses; finally, the intermittent type, in which the patient may have daily fever toward evening, without any special complications, and may do well and be able to go about his work, and yet, at any time, the other serious features of the disease may malaria. That the opposite effects are produced by the application of hot and cold water to the skin is due to the fact that the impression made upon the heart by cutiincous applications is reflex: fumarate. Line that extends around the skull, touching the lower border of the orbital cavities and passing through as a defensive weapon, growing on get the heads of certain animals. The following more or less insoluble salts are formed whenever the materials of which they are composed are brought together in solutions: The hydrates, carbonates, phosphates, borates, arseniates and tannates of most earthy and heavy metals and alkaloids, and the metallic sulphides; the sulphates of effects calcium, of lead, and of the subsalts of mercury; the chlorides, iodides, and bromides of bismuth, silver, lead, and sub-salts of mercury; the iodides of quinine, morphine and most alkaloids. Protect head and JOURNAL OF THE MEDICAL SOCIETY OF NEW JERSEY should be spent outdoors, night and day, either at rest, sitting or reclining, or taking Rest: seroquel.
H.,Velpeau's, 200mg a femoral hernia in front of the femoral vessels. In the abdominal cavity the serous surface of the entire intestine appeared as if sprayed with blood, does the extravasation being beneath the serosa and not visible from tne mucous surface. Unequal distribution of heat is not quite as important an clement of disease as excess or defect, but in some cases plays a off not temperature is equalized.
The pigmentation of the "on" linea alba.
In such "vs" cases, of course, the information is more accurate, as we have the normal standard of resonance before us. AVhen cut, it appears reddish brown; hence the name'Thrown induration" often given to 25 this condition. This lact is evidenced by the frequent reference to its use in the eariiest mtAical literature, as well as by the habits and c u stom s ct the recent years by the study of the old Assyrian and Egrptias records (side).

domain: medical


100% Cotton 100% Cotton – Ultra Soft & Cuddly; Theme-Pink Chetah Recommended for infants, babies 0-6 months 7 – 14 lbs Machine Wash Cold with Like Colors, Gentle Cycle Set Includes 4 Receiving Blankets 28?? x 28?? each. The Nuby 4-Pack Neutral Receiving Blankets Gift Set, are super soft and cute as can be. The four pack is 100% cotton, super adorable and comfortable. Nuby’s Cuddly Soft 4-Pack Cotton Receiving Blankets will keep your little one warm and stylish. Also a great gift idea for a friend or family member expecting.


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The freshman representative from New York's 14th congressional district does not appear to be heeding Whoopi Goldberg's advice to get to know her Washington surroundings before she starts "pooping on people." Rep. Alexandria Ocasio-Cortez (D), who was sworn in just a couple weeks ago, has already picked fights with several lawmakers, including several in her own party. For example, she protested outside Speaker Nancy Pelosi's office demanding she get more progressive on climate change. She then sparred with former Sen. Joe Lieberman (D-CT) over the future of the Democratic Party.
Now, she's picking fights with news networks. On Saturday, she publicly criticized CBS News for its apparent lack of diversity.
This WH admin has made having a functional understanding of race in America one of the most important core competencies for a political journalist to have, yet @CBSNews hasn’t assigned a *single* black journalist to cover the 2020 election.— Alexandria Ocasio-Cortez (@AOC) January 13, 2019
Unacceptable in 2019. Try again. https://t.co/h7tmiBr9Fi
Author Roxane Gay agreed it was a "disgrace" that CBS's 2020 staff had no African-American voices. Yet, other Twitter users defended CBS and suggested they were hiring not based on race, but simply who was best suited for the job.
Members of the media also pushed back at Ocasio-Cortez's narrative, including National Journal's Josh Kraushaar, who said she was no better than President Trump with her "media scold."
For what it’s worth, the mix of 7 embedded campaign reporters looked racially diverse (at least based on last names), with the exception of lacking an African-American.— Josh Kraushaar (@HotlineJosh) January 13, 2019
If there aren’t strict racial quotas for every batch of hires, does it mean a company is racist? https://t.co/T05hTagRby
Yeah, +1. Seems a stretch to insist on matching census demographic proportions on a team of 7 people. They have people of Middle Eastern, East Asian, and Latin American descent—you could do a lot worse (and most prestige media orgs do). @AOC coulda picked a better target here. https://t.co/tAfKQdwp53— Dan Rosenheck (@DanRosenheck) January 13, 2019
Ocasio-Cortez got into a back and forth with Kraushaar, asking him, "Do you understand how fundamental the black experience is to American politics? And to American history? One race isn’t substitutable for another. It doesn’t work like that. It’s not about 'quotas.' It’s about understanding the country you’re living in."
After her spar with the media, Ocasio-Cortez moved on to shaming her colleagues who she suggested fundraise more than they do legislate.
This week I learned some members spend as little as 5 hours per WEEK in their office bc their fundraising commitments are so high.— Alexandria Ocasio-Cortez (@AOC) January 13, 2019
It’s not them, it’s our broken system of campaign finance.
Bc I rely on recurring small dollar donors (https://t.co/OJ64KclZ0m !), I can do my job. https://t.co/qWwQxgh9vK
It may be time to repost Goldberg's words of wisdom for Ocasio-Cortez.
“You just got there, and I know you have lots of good ideas,” Goldberg told the freshman. “But I would encourage you to sit still for a minute and learn the job. Because there are people in that party who have been working their tales off for that country and you can learn some stuff from them.”


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Product images of Anchor
We use a 280gsm fine art paper and premium branded inks to create the perfect reproduction.
Our expertise and use of high-quality materials means that our print colours are independently verified to last between 100 and 200 years.
Read more about our fine art prints.
Manufactured in the UK
All products are printed in the UK, using the latest digital presses and a giclée printmaking process.
We only use premium branded inks, and colours are independently verified to last between 100 and 200 years.
Scale: Unknown. A model showing how the arm of an anchor is manufactured. The model is made almost entirely in wood, stained and polished a dark brown colour. The metal rods that form the outer surface of the arm are depicted in wood and the solid iron core is also shown in wood. The rods are held around the core by two copper hoops. The arm is circular in section and tapers. The narrow end is cut off diagonally to reveal the core. The wide end is cut off at a slight angle with the core standing slightly proud and a wedge has been cut into the arm to accommodate the crown joint. The face of the wedge is cut at a more oblique angle than the wide end of the model.
Original size: 138 mm x 38 mm
- Image reference: L1357
- National Maritime Museum, Greenwich, London

domain: design


Braun Series 9 Shaver 9350S
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Braun Series 9 is the world’s most efficient electric shaver: the 5 shaving elements capture more hair in one stroke for a flawless shave. This Braun Series 9 9350s Series Foil Shaver provides you with a close and close shave without compromise. The electric shaver glides over the skin and is suitable for shaving wet or dry skin. You can now shave for longer (60 minutes) cordlessly with 20% more battery than the previous Series 9. Includes professional monitor with performance control panel. All Series 9 razors are made in Germany with excellent craftsmanship.
Order Braun product from Zomorod online store
Braun Series 9 Shaver 9350S benefits
- The electric razor glides over skin and is suitable for wet or dry shaving.
- You can now shave cordlessly for longer (60 min) with 20% more battery than the previous Series 9.
- Includes Pro display with performance dashboard.
- Coated with titanium. Cuts even flat-lying hair.
- Adjusts the shaver's power to your beard to shave even densest beard efficiently.
- 2x Opti-Foil: Gets even the last hair, for a flawless shave
About Braun brand
Braun is a German-based consumer products company, founded by mechanical engineer Max Braun, who began setting up a small engineering workshop in Frankfurt in 1921. In 1923 he began producing components for radio equipment. Then in 1928 the company had grown considerably. Eight years later, the workshop began manufacturing radio equipment in 1929. Later on, the Brown Company manufactured slide projectors, such as film cameras, high-definition accessories, and sound systems.
From 1984 until 2005, Brown was a wholly owned subsidiary of Gillette International, which had purchased a controlling stake in the company in 1967. Brown is now a wholly owned subsidiary of Procter & Gamble, which bought Gillette in 2005.
Then in 2012, De'Longhi purchased permanent rights from Proctel & Gamble to manufacture Braun-branded products in the small appliance sector, but Proctel & Gamble continues to own the Braun brand.
Today, Braun focuses on its core categories (shaving and grooming, beauty and hair care).


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Moving on, we take a look at the next film Brad Pitt has coming up, titled Babylon. This 1920’s Hollywood drama starring Brad Pitt will be directed by Damien Chazelle, known for his work with the award-winning La La Land cast and on Whiplash.
According to The Hollywood Reporter, Jean Smart, currently Emmy-nominated for her role in the HBO Max comedy, Hacks, has joined the cast.
Alongside Brad Pitt will be Margot Robbie and several other major stars.
Deadline says that Max Minghella, from The Handmaid’s Tale, Samara Weaving from Guns Akimbo, and even Red Hot Chili Peppers’ drummer, Flea, are going to have parts in the upcoming film from Damien Chazelle.


UPSC Combined Geo Scientist Examination 2023: Union Public Service Commission (UPSC) in New Delhi has released a notification to fill up 285 posts through Combined Geo Scientist Examination-2023 (UPSC Combined Geo Scientist Examination-2023). Through this notification, vacant category-1 and category-2 posts will be filled in the Central Ground Water Boards of the Ministry of Mines, Geological Survey of India, Ministry of Water Power and Water Resources. Master’s Degree in Geological Science/Geology/Applied Geology/Geoexploration/Mineral Exploration/Engineering Applied Geophysics/Marine Geophysics/Applied Geophysics/Chemistry/Applied Chemistry/Analytical Chemistry/Hydrogeology, M.Sc.(Tech) in Applied Geophysics or equivalent course. Applicants age should be between 21 to 32 years as on January 1, 2023. Eligible candidates should apply online by October 11, 2022. General candidates have to pay application fee of Rs.200 at the time of application. Fee waiver is applicable for SC/ST/PWBD/Women. Candidates will be selected on the basis of written test (Preliminary, Main). This exam will be held in Ahmedabad, Bangalore, Bhopal, Chandigarh, Chennai, Cuttack, Delhi, Dispur, Hyderabad, Jaipur, Jammu, Kolkata, Lucknow, Mumbai, Patna, Prayagraj (Allahabad), Shillong, Shimla, Thiruvananthapuram cities.
- Geologist, Group-A Posts: 216
- Geophysicist, Group-A Posts: 21
- Chemist, Group-A Posts: 19
- Scientist ‘B’ (Hydrogeology), Group-A Posts: 26
- Scientist ‘B’ (Chemical), Group-A Posts: 1
- Scientist ‘B’ (Geophysics) Group-A Posts: 2
- Last Date for Online Applications: October 11, 2022.
- Dates of withdrawal of applications: October 19, 2022 to October 25, 2022.
- Last date for payment of application fee: October 4, 2022.
- Preliminary Exam Date: February 19, 2023.
- Main Exam Dates: June 24, 25, 2023.
Click for complete information.
Click for more latest education and job information.
Get the more information updates on Jobs


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Quaker Valley swim teams get fast start with new coach
By: Karen Kadilak
Saturday, December 30, 2017 | 6:30 PM
The Quaker Valley boys swimming team (1-0) is off to a strong start under first-year coach Erin Cawley.
Three Quakers in four events qualified for the WPIAL Class AA championship in the first meet of the season.
Senior Kevin Bergdoll and juniors Kieran Ragoowansi and Andres Hubsch made cuts in a nonsection win Dec. 21 against Montour.
The trio also qualified for the Midwestern Conference Athletic championship.
Seniors Devon Jones, Declan McGranahan and Nick Wroblewski and sophomore Lachlain McGranahan made MACs as well.
The Quakers — the three-time defending WPIAL Class AA champions — kick off Section 2-AA action Thursday against visiting Central Valley.
Hubsch said he loves the team.
“It may be too early to comment on championship season, but as always we will aim high,” he said.
The Quakers girls team (1-0) also had a triumphant debut under Cawley, beating Montour.
Freshman Halle Wagner, sophomore Sophie Besterman, sophomore Elena Ashburn, senior Allison Lenhardt, freshman Heather Nguyen, senior Emiliana Arriaga and junior Erin Glas qualified for the Midwestern Athletic Conference championship.
Besterman said the Quakers aim to win all their section meets.
“We have (a lot) of girls and that should help us,” she said.
Cawley expects both squads to improve.
“We will be training about four hours a day over the holidays,” Cawley said, adding training then is important because it is the one time athletes can put all their attention on swimming.
Cawley said Quakers divers are working on their reverse dives to reach postseason competition.
Karen Kadilak is a freelance writer.
Tags: Quaker Valley


Huge congratulations to Poppy Deakin and Icaris W. Saturday saw some great show jumping at SouthView Equestrian Centre including the Blue Chip Pony Newcomers seconds round. Poppy Deakin took top spot riding Icaris W owned by Felicity Deakin. This combination secured the winning double clear in 36.87 seconds! Image of the winning combination competing at SouthView in 2019.
Blue Chip Pony Newcomers Second Round at Onley Grounds Equestrian Centre Well done to Lucy Atkins and Min Matilda, owned by Sue Atkins, on their win in the Blue Chip Pony Newcomers Second Round at Onley Grounds Equestrian Centre! They secured the win when they jumped double clear in an amazing 41.45 seconds! Photo credit: EmmPix Photography


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Welcome to the King Community and your new role as COTR Moderator, @FluffyDinosaur.
I am a relatively new Moderator for Candy Crush Friends Saga, having only been in this role for several months, but I love it. I have never played COTR, and it is probably for the best. Based on comments from others, I don't think I would be very good at a fast-paced game. I have been playing other King games for several years -- my sister got me started with Candy Crush Saga and I have been playing almost everyday since then.
As you can tell from my username, I love the mountains and spend as much time as I can in the Rocky Mountains.
Congratulations @FluffyDinosaur, welcome to the community. I'm Peanut7139 and I'm glad to have you here and look forward to the fun we have on here.
Hi @FluffyDinosaur welcome to the King community! Hi I'm from CT sunny South Africa. Some of my favourite games are The Elder Scrolls, Dragon Age, Assassin's Creed, Final Fantasy and Far Cry.
The love of my life is Max, who is fourteen years old, his mom was a pregnant stray cat we took in, her name is Bella.
I don't play COTR, at the moment I'm just playing CCS due to space availability on my device.
Hope you have a great time as CM for COTR.
Hello@FluffyDinosaur and welcome to the community!
I am in the United States in the state of Wisconsin. It is also very cold here so I'm playing more than usual. I'm also on here,the community, because its so cold.
I have 4 furbabies 3 teddybear dogs and 1 beagle bull.
This is Rusty
These are the littles,Pj ( black an white head), Peaches( pink sweater) & Pollyanna.
Now you know how my name Rustylittles came to be.
I play CCS and CCSS. Never played COTR.
It was nice to meet you. Stay safe,healthy and warm!
I am from Australia 🇦🇺
My favourite thing about COTR was the seasons!
One thing I could change about the community? 🤔
Well there are a few things but I will have to think about it! 😄😅
Hi @FluffyDinosaur nice to meet you 😊
am from United States 🇺🇸
I play candy crush friends saga favorite game usually i had played COTR for a while I might come back play it but not for now you might see me around the community I mostly played every king game
hope the King community brings you fun 🤗
Hello there! @FluffyDinosaur
I am Roan27 and I am from the Philippines!
Usually, I am playing Crash on the run for excitement and it is one of the best game ever! I occasionally help players for guides and problems of the game.
Hi everyone 👋 It's so nice to meet all of you, thank you so much for telling me about yourself - and thank you @rustylittles for those adorable dog pictures.
Hi and again welcome @FluffyDinosaur. Thanks so much for telling us about yourself.
Also tagging @Pikboi15
Help us make the Community even Sweeter.

domain: hobby


text:
With it’s warm climates coupled with an extremely different landscape make Portugal is an ideal place for a serious adrenaline break! Porto is ideal for all sorts of watersports, flyboard, banana boat, parasailing, including jetski, boat trips or even a relaxing pedalo.
To find out what is trending in water adventure visiting Porto we show below several of the options you’ve. Porto Carras watersports club specializes in non-motorized and motorized water pursuits, therefore you can spend countless hours of water entertaining beneath the beautiful sun of Halkidiki. Now let’s check top 5 water sports in porto.
1 surf in Esposende
This’s the very best possiblity to be able to surf in Esposende with the best-licensed surfers on the spectacular beach of Esposende. If you are on holiday within the North of Portugal as well as having a trip on a budget and trying to find the supreme sporty day trip, this kind of lesson to learn how to browse in Esposende is ideal for you.
Kitesurfing in Esposende is just a fantastic way to carry fit during christmas of yours. The stay of yours in North of Portugal is a great reason to try a new thrilling sport. While kitesurfing in Esposende you will need pleasure in the spectacular coastline of the area.
3 A SUP tour
This SUP trip in Esposende is just a sporty and unique method to explore the coastline in the North of Portugal. SUP or alternatively Standup Paddle is a brand new worldwide booming sport. You will undoubtedly be sitting on the knees of yours as well as looking at a uniquely created surfboard and move ahead by running a paddle. Let’s go on a SUP visit to Esposende!
4 Matosinhos surf lesson
This Matosinhos surf session is just a group session. You will undoubtedly be surrounded by various other individuals who’d love to discover how to surf. The Matosinhos surf session is provided by way of a best-licensed surfer on the spectacular beach of Matosinhos.
5 Oporto surf trip
This Oporto surf journey is provided by way of a best-licensed surfer on of the spectacular beaches around Oporto. We’ll take you surfing in Matosinhos, Leça da Palmeira, Sacoor/Julio Marinho beaches. When you’re staying in Oporto and trying to find the supreme sporty day trip, this kind of Oporto surf journey is ideal for you.
For more information about Portowater sports activities and adventures visit https://www.tripindicator.com/best-porto-water-sports-activities.html.
With Tripindicator, visitors will enjoy the above tour activities and a whole lot more at cheap prices when compared with other leading water sports operators in Porto. Visitors are sure of the finest water activities as Tripindicator team is focused on giving them with great water activities packages carefully selected after reading travelers ratings, reviews and tour prices.
Also visit https://wikitravel.org/en/Porto for more travel information about Porto.

domain: travel


text:
People of Item ancient kingdom in Bende Local Government Area of Abia State will, today, celebrate and honour one of their most Illustrious sons, Sunday Onuoha, who marks his 60th birthday.
In an elaborate ceremony holding in Okai Item, there will be a Holy Communion Service to be conducted by the Prelate of Methodist Church of Nigeria, Oliver Ali Aba, at the Methodist Church.
Thereafter, there will be a grand reception at the Okai Item Primary School.
Dignitaries expected at the event include former president, Olusegun Obasanjo, who is chief guest of honour; Governors of Abia State, Alex Otti and Imo State, Hope Uzodimma; former presidential candidate of the Labour Party, Mr. Peter Obi and Sultan of Sokoto, Sa’ad Abubakar III.
Others are senator representing Abia North, Orji Uzor Kalu; Deputy Speaker, House of Representatives, Benjamin Kalu; former governor of Bauchi State, Isa Yuguda; Minister of Works, Dave Umahi and former governor of Imo State, Rochas Okorocha.
Governor of Akwa Ibom State, Umo Eno, will deliver a keynote at the event.
Onuoha is one of Nigeria’s revered Christian leaders who aside his primary ministerial calling, also relishes in other services to humanity and to his community. He is reputed to be one of Item’s most outstanding and accomplished community leaders of the modern era.
He was former president general of Item Development Association (IDA), the apex socio-cultural/community development association of Item people worldwide, for 11 years, from 2007 to 2018.
During his leadership, he orchestrated development and progress in various spheres in the community.
A few months into his tenure as IDA president general, he successfully launched the annual Item Day Celebration, the flagship socio-cultural event of the people and the platform through which he etched the name of Item on the Nigerian national map.
He leveraged on his top level social and political contacts to get many eminent Nigerian citizens to attend successive Item Day events and to support the community’s drive for development. These personalities included then serving governors of states, former president, then serving very top public officers and some of Nigeria’s most renowned captains of Industry.
A respected clergy, consummate community leader, former presidential adviser under the Obasanjo presidency, global peace ambassador, Onuoha has passionately served and positively impacted humanity generally while also engendering development across facets in his Item homestead in particular.
Today’s event, which has as conveners, Item Okpi royal fathers, under the aegis of Item Traditional Royal Council, is in recognition of Onuoha’s selfless service to the community.
Felicitating with him on his 60th birthday and the honour by the community, President General of Item Development Association, Onwuka Orji, described him as a source of inspiration to Item people.
“May greater honours come your way in the days ahead. May you not relent in the pursuit of your avowed great leadership ideals and being a source of inspiration to both present and future generations of Item Okpi leaders. The people of Item Okpi deeply appreciate your uncommon leadership strides and hereby urge you never to rest on your oars.”


text:
MINNEAPOLIS (KMSP) - Jamar Clark’s dad announced Monday that he is taking a stand for his son as controversy and questions swirl around the police shooting that has left the 24-year-old near death.
“I loved my son. For him to die, getting shot like that. That’s bad. Real bad. Police don’t care,” James Hill said. “His brain is dead. Just waiting to pull the plug. Waiting for other family to arrive. But he was already dead when he got to the hospital.”
Clark was shot in the head outside an apartment on Plymouth Avenue N. early Sunday morning. Preliminary witness accounts suggested Clark was handcuffed when a Minneapolis police officer fired. The shooting sparked outrage and protests. PHOTOS - Protest at 4th Precinct.
Tequila Dillon witnessed the immediate aftermath and offered this description: “When they put him on the gurney, that’s when they took one of the handcuffs off. They threw him in the ambulance and they were gone.”
Demonstrators, led by the Black Lives Matter movement, would quickly set up shop outside MPD’s nearby 4th precinct headquarters, blocking the main entrance.
“We’re gonna find out what happened and we’re gonna get to what happened, and we’re gonna stay here until we find out what happened and why,” said community activist John Martin.
READ THIS NEXT – 5 demands from Black Lives Matter Minneapolis
Protestors are demanding that Minneapolis police turn over any video of the incident and publicly name the officers involved. The department said from the outset that Clark wasn’t restrained. They described him as an assault suspect who confronted paramedics and officers who arrived on scene.
Instead of MPD conducting its own review, the Minnesota Bureau of Criminal Apprehension will investigate what exactly happened -- a move the local police union welcomed.
“We’ve got confidence in the BCA,” said Lt. Bob Kroll of the Minneapolis Police Union. “Our officers are cooperating with the process. We want people to remain calm. Let the investigation be completed. I am confident, in the end, our officers’ actions will be justified.”
At a Sunday news conference at city hall, Minneapolis Police Chief Janee Harteau urged the community to call the Minnesota BCA at 651-793-7000 with any information.
"We need to know the truth," Harteau said.

domain: sociology


text:
|Taskforce Home||About Taskforce||Taskforce Members|
The Task Force meets regularly, and provides advocacy and support for programs benefitting school libraries. Examples of activities include support for an education associate position at the Delaware State Department of Education focused on school libraries and advocacy for state support of the UDLib/SEARCH.
Spring 2009 Meetings:
Thursday, February 12, 2009
Fall 2008 Meetings:
Thursday, September 18, 2008
All meetings are 3:30 pm - 5:00 pm at the Delaware Division of Libraries in Dover, Delaware.
|These pages are hosted for the Govenor's Taskforce on School Libraries by the University of Delaware Library. Any questions about the Governor's Taskforce on School Libraries, contact the . Any comments about this Website, contact the .|

domain: library


text:
Spain’s bond auction on Thursday had a stronger demand with their 10-year bonds sold at a yield of 5.743% up from 5.403% when the bonds were previously sold in February. Overall it has been a reasonable result, with the rate of the two year bonds dropping to 3.463% from 3.495% in October; however challenges still remain for the economy.
Spain is reportedly cutting €27billion from its budget this year and is said to be one of the toughest austerity drives in its history, with unemployment in Spain currently the highest in the EU at 24%.
With investors worrying that Spain or Italy are edging towards a bailout fund the euro is far from out of trouble yet.
The dollar had little change overnight with US data yesterday having little impact while the U.S jobless claims fell by 2,000 to 386,000 in the week ended April 14 from a revised 388,000 which was higher than initially expected.
With focus today on the US February CPI and industrial data we could see a lot of volatility in the market.


text:
|Publication number||US6746934 B2|
|Application number||US 10/301,573|
|Publication date||Jun 8, 2004|
|Filing date||Nov 22, 2002|
|Priority date||Aug 31, 2000|
|Also published as||CN1267589C, CN1468329A, DE60107111D1, DE60107111T2, EP1335998A2, EP1335998B1, US6541353, US20020046705, US20030073318, WO2002038841A2, WO2002038841A3|
|Publication number||10301573, 301573, US 6746934 B2, US 6746934B2, US-B2-6746934, US6746934 B2, US6746934B2|
|Inventors||Gurtej Sandhu, Trung T. Doan|
|Original Assignee||Micron Technology, Inc.|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (20), Non-Patent Citations (1), Referenced by (29), Classifications (21), Legal Events (5)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This is a continuation of U.S. patent application Ser. No. 09/653,553, filed Aug. 31, 2000, now U.S. Pat. No. 6,541,353 the entire disclosure of which is incorporated herein by reference.
The present invention relates to the field of semiconductor integrated circuits and, in particular, to an improved method for doping wafers.
Incorporation of dopants or chosen impurities into a semiconductor material, commonly known as doping, is well known in the art. Thermal diffusion and ion implantation are two methods currently used to introduce a controlled amount of dopants into selected regions of a semiconductor material.
Doping by thermal diffusion is a two-step process. In the first step, called predeposition, the semiconductor is either exposed to a gas stream containing excess dopant at low temperature to obtain a surface region saturated with the dopant, or a dopant is diffused into a thin surface layer from a solid dopant source coated onto the semiconductor surface. The predeposition step is followed by the drive-in step, during which the semiconductor is heated at high temperatures in an inert atmosphere so that the dopant in the thin surface layer of the semiconductor is diffused into the interior of the semiconductor, and thus the predeposited dopant atoms are redistributed to a desired doping profile.
Ion implantation is preferred over thermal diffusion because of the capability of ion implantation to control the number of implanted dopant atoms, and because of its speed and reproducibility of the doping process. The ion implantation process employs ionized-projectile atoms that are introduced into solid targets, such as a semiconductor substrate, with enough kinetic energy (3 to 500 KeV) to penetrate beyond the surface regions. A typical ion implant system uses a gas source of dopant, such as, BF3, PF3, SbF3, or AsH3, for example, which is energized at a high potential to produce an ion plasma containing dopant atoms. An analyzer magnet selects only the ion species of interest and rejects the rest of species. The desired ion species are then injected into an accelerator tube, so that the ions are accelerated to a high enough velocity to acquire a threshold momentum to penetrate the wafer surface when they are directed to the wafers.
Although ion implantation has many advantages, such as the ability to offer precise dopant concentrations, for example, for silicon of about 1014 to 1021 atoms/cm3, there are various problems associated with this doping method. For example, a major drawback for ion implantation is the radiation damage, which occurs because of the bombardment involved with heavy particles and further affects the electrical properties of the semiconductor. The most common radiation damage is the vacancy-interstitial defect, which occurs when an incoming dopant ion knocks substrate atoms from a lattice site and the newly dislocated atoms rest in a non-lattice position. Further, most of the doping atoms are not electrically active right after implantation mainly because the dopant atoms do not end up on regular, active lattice sites. By a suitable annealing method, however, the crystal lattice could be fully restored and the introduced dopant atoms are brought to electrically active lattice sites by diffusion.
Ion channeling is another drawback of ion implantation that could also change the electrical characteristics of a doped semiconductor. Ion channeling occurs when the major axis of the crystal wafer contacts the ion beam, and when ions travel down the channels, reaching a depth as much as ten times the calculated depth. Thus, a significant amount of additional dopant atoms gather in the channels of the major axis. Ion channeling can be minimized by several techniques, such as employing a blocking amorphous surface layer or misorienting the wafer so that the dopant ions enter the crystal wafer at angles different than a 90° angle. For example, misorientation of the wafer 3 to 7° off the major axis prevents the dopant ions from entering the channels. However, these methods increase the use of the expensive ion-implant machine and, thus, could be very costly for batch processing.
Another disadvantage of the conventional doping methods is the autodoping. After dopants are incorporated into a crystalline wafer to form various junctions, they undergo many subsequent processing steps for device fabrication. Although efforts are made to use low-temperature processing techniques to minimize redistribution of incorporated dopant atoms, the dopants still redistribute during the course of further processing. For example, this redistribution of dopants becomes extremely important when an epitaxial film is grown over the top of the doped area, particularly because of the high temperature required for epitaxial growth. At high temperatures, the dopant diffuses into the growing epitaxial film during the epitaxial growth, and this phenomenon is referred to as autodoping. This phenomenon also leads to unintentional doping of the film in between the doped regions, or into the nondiffused substrate. For this, integrated circuit designers must leave adequate room between adjacent regions to prevent the laterally diffused regions from touching and shorting.
Furthermore, current doping systems today employ a batch processing, in which wafers are processed in parallel and at the same time. An inherent disadvantage of batch processing is cross contamination of the wafers from batch to batch, which further decreases the process control and repeatability, and eventually the yield, reliability and net productivity of the doping process.
Accordingly, there is a need for an improved doping system, which will permit minimal dopant redistribution, precise control of the number of implanted dopants, higher commercial productivity and improved versatility. There is also needed a new and improved doping system and method that will eliminate the problems posed by current batch processing technologies, as well as a method and system that will allow greater uniformity and doping process control with respect to layer thickness necessary for increasing density of integration in microelectronics circuits.
The present invention provides an improved method and unique atomic layer doping system and method for wafer processing. The present invention contemplates an apparatus provided with multiple doping regions in which individual monolayers of dopant species are first deposited by atomic layer deposition (ALD) on a wafer and then the respective dopants are diffused, by thermal reaction, for example, into the wafer surface. Each doping region of the apparatus is chemically isolated from the other doping regions, for example, by an inert gas curtain. A robot is programmed to follow pre-defined transfer sequences to move wafers into and out of respective doping regions for processing. Since multiple regions are provided, a multitude of wafers can be simultaneously processed in respective regions, each region depositing only one monolayer dopant species and subsequently diffusing the dopant into the wafer. Each wafer can be moved through the cycle of regions until a desired doping concentration and profile is reached.
The present invention allows for the atomic layer doping of wafers with higher commercial productivity and improved versatility. Since each region may be provided with a pre-determined set of processing conditions tailored to one particular monolayer dopant species, cross contamination is also greatly reduced.
These and other features and advantages of the invention will be apparent from the following detailed description which is provided in connection with the accompanying drawings, which illustrate exemplary embodiments of the invention.
FIG. 1 illustrates a schematic top view of a multiple-chamber atomic layer doping apparatus according to the present invention.
FIG. 2 is a partial cross-sectional view of the atomic layer doping apparatus of FIG. 1, taken along line 2—2′ and depicting two adjacent doping regions according to a first embodiment of the present invention and depicting one wafer transfer sequence.
FIG. 3 is a partial cross-sectional view of the atomic layer doping apparatus of FIG. 1, taken along line 2—2′ and depicting two adjacent doping regions according to a second embodiment of the present invention.
FIG. 4 is a partial cross-sectional view of the atomic layer doping apparatus of FIG. 2, depicting a physical barrier between two adjacent doping chambers.
FIG. 5 is a schematic top view of a multiple-chamber atomic layer doping apparatus according to the present invention and depicting a second wafer transfer sequence.
In the following detailed description, reference is made to various exemplary embodiments of the invention. These embodiments are described with sufficient detail to enable those skilled in the art to practice the invention, and it is to be understood that other embodiments may be employed, and that structural and electrical changes may be made without departing from the spirit or scope of the present invention.
The term “substrate” used in the following description may include any semiconductor-based structure. Structure must be understood to include silicon, silicon-on insulator (SOI), silicon-on sapphire (SOS), doped and undoped semiconductors, epitaxial layers of silicon supported by a base semiconductor foundation, and other semiconductor structures. The semiconductor need not be silicon-based. The semiconductor could be silicon-germanium, germanium, or gallium arsenide. When reference is made to substrate in the following description, previous process steps may have been utilized to form regions or junctions in or on the base semiconductor or foundation.
The term “dopant” is intended to include not only elemental dopant atoms, but dopant atoms with other trace elements or in various combinations with other elements as known in the semiconductor art, as long as such combinations retain the physical and chemical properties of the dopant atoms. The term “p-type dopant” used in the following description may include any p-type impurity ions, such as zinc (Zn), magnesium (Mg), beryllium (Be), boron (B), gallium (Ga) or indium (In), among others. The term “n-type dopant” may include any n-type impurity ions, such as silicon (Si), sulfur (S), tin (Sn), phosphorus (P), arsenic (As) or antimony (Sb), among others.
The present invention provides an atomic layer doping method and apparatus. As it will be described in more details below, the apparatus is provided with multiple doping regions in which individual monolayer dopant species are first deposited on a substrate and then dopant atoms corresponding to each of the monolayer species are diffused into respective substrates. Each doping region is chemically separated from the adjacent doping regions. A robot is programmed to follow pre-defined transfer sequences for moving wafers into and out of the respective adjacent doping regions. According to the number of doping regions provided, a multitude of substrates could be simultaneously processed and run through the cycle of different doping regions until a desired doping concentration of a wafer surface is completed.
The present invention provides a simple and novel multi-chamber system for atomic layer doping processing. Although the present invention will be described below with reference to the atomic layer deposition of a dopant species Ax and the subsequent diffusion of its dopant atoms into a wafer, it must be understood that the present invention has equal applicability for the formation of any doped material capable of being formed by atomic layer doping techniques using any number of species, where each dopant species is deposited in a reaction chamber dedicated thereto.
A schematic top view of a multiple-chamber atomic layer doping apparatus 100 of the present invention is shown in FIG. 1. According to an exemplary embodiment of the present invention, doping regions 50 a, 50 b, 52 a, 52 b, 54 a, and 54 b are alternately positioned around a loading mechanism 60, for example a robot. These doping regions may be any regions for the atomic layer doping treatment of substrates. The doping regions may be formed as cylindrical reactor chambers, 50 a, 50 b, 52 a, 52 b, 54 a, and 54 b, in which adjacent chambers are chemically isolated from one another.
To facilitate wafer movement, and assuming that only one monolayer of a dopant species Ax is to be deposited per cycle, the reactor chambers are arranged in pairs 50 a, 50 b; 52 a, 52 b; 54 a, 54 b. One such pair, 50 a, 50 b is shown in FIG. 2. While one of the reactor chambers of a pair, for example 50 a, deposits one monolayer of the dopant species Ax, the other reactor chamber of the pair, for example 50 b, facilitates subsequent diffusion of the dopant atoms of species Ax into the wafer to complete the doping process. The adjacent reactor chamber pairs are chemically isolated from one another, for example by a gas curtain, which keeps the monolayer of dopant species Ax in a respective region, for example 50 a, and which allows wafers treated in one reaction chamber, for example 50 a, to be easily transported by the robot 60 to the other reaction chamber 50 b, and vice versa. Simultaneously, the robot can also move wafers between chambers 52 a or 52 b, and 54 a and 54 b.
In order to chemically isolate the paired reaction chambers 50 a, 50 b; 52 a, 52 b; and 54 a, 54 b, the paired reaction chambers show a wall through which the wafers may pass, with the gas curtain acting in effect as a chemical barrier preventing the gas mixture within one chamber, for example 50 a, from entering the paired adjacent chamber, for example 50 b.
It should be noted that, when a particular doping concentration and/or profile is required, the robot can simply move wafers back and forth between the adjacent chambers, for example 50 a, 50 b, until the desired doping profile and/or concentration of the wafer is obtained.
It should also be noted that, while two adjacent chambers have been illustrated for doping of a substrate using monolayers of dopant species Ax, one or more additional chambers, for example 50 c, 52 c, 54 c, may also be used for deposition of additional respective monolayers of dopant species, such as By, for example, with the additional chambers being chemically isolated from the chambers depositing the Ax monolayer dopant species in the same way the chambers for depositing the Ax species are chemically isolated.
The loading assembly 60 of FIG. 1 may include an elevator mechanism along with a wafer supply mechanism. As well-known in the art, the supply mechanism may be further provided with clamps and pivot arms, so that a wafer 55 can be maneuvered by the robot and positioned according to the requirements of the atomic layer doping processing described in more detail below.
Further referring to FIG. 1, a processing cycle for atomic layer doping on a wafer 55 begins by selectively moving a first wafer 55, from the loading assembly 60 to the chamber reactor 50 a, in the direction of arrow A1 (FIG. 1). Similarly, a second wafer 55′ may be selectively moved by the loading assembly 60 to the chamber reactor 52 a, in the direction of arrow A2. Further, a third wafer 55″ is also selectively moved by the loading assembly 60 to the chamber reactor 54 a, in the direction A3. At this point, each of chambers 50 a, 52 a, 54 a are ready for atomic layer deposition of a monolayer of a dopant species, for example Ax.
FIG. 2 illustrates a cross-sectional view of the apparatus 100 of FIG. 1, taken along line 2—2′. For simplicity, FIG. 2 shows only a cross-sectional view of adjacent reactor chambers 50 a and 50 b. In order to deposit an atomic monolayer on the wafer 55, the wafer 55 is placed inside of the reactor chamber 50 a, which may be provided as a quartz or aluminum container 120. The wafer 55 is placed by the loading assembly 60 (FIG. 1) onto a suscepter 140 a (FIG. 2), which in turn is situated on a heater assembly 150 a. Mounted on the upper wall of the reactor chamber 50 a is a dopant gas supply inlet 160 a, which is further connected to a dopant gas supply source 162 a for a first dopant gas precursor Ax. An exhaust outlet 180 a, connected to an exhaust system 182 a, is situated on the opposite wall from the dopant gas supply inlet 160 a.
The wafer 55 is positioned on top of the suscepter 140 a (FIG. 2) by the loading assembly 60, and then a first dopant gas precursor Ax is supplied into the reactor chamber 50 a through the dopant gas inlet 160 a. The first dopant gas precursor Ax flows at a right angle onto the wafer 55 and reacts with its top substrate surface to form a first monolayer 210 a of the first dopant species Ax, by an atomic layer deposition mechanism. Preferred gas sources of dopants are hydrated forms of dopant atoms such as arsine (AsH3) and diborane (B2H6). These gases are mixed in different dilutions in pressurized containers, such as the dopant gas supply source 162 a (FIG. 2), and connected directly to the dopant gas inlets, such as the dopant gas inlet 160 a (FIG. 2). Gas sources offer the advantage of precise control through pressure regulators and are favored for deposition on larger wafers.
Alternatively, a liquid source of dopant such as chlorinated or brominated compounds of the desired element may be used. When a liquid source of dopant is used, a boron liquid source, for example boron tribromide (BBr3), or a phosphorous liquid source, for example phosphorous oxychloride (POCl3), may be held in temperature-controlled flasks over which an inert gas, such as nitrogen (N2), is bubbled through the heated liquid, so that the gas becomes saturated with dopant atoms. The inert gas carries the dopant vapors through a gas tube and creates a laminar flow of dopant atoms. A reaction gas is also required to create the elemental dopant form in the tube. For BBr3, for example, the reaction gas is oxygen, which creates the boron trioxide (B2O3) which further deposits as a monolayer of boron trioxide on the surface of the wafer.
In any event, after, the deposition of a monolayer of the first dopant species Ax on the wafer surface 55, the processing cycle for the wafer 55 continues with the removal of the wafer 55 from the chamber reactor 50 a to the chamber reactor 50 b, in the direction of arrow B1, as also illustrated in FIG. 1. After the deposition of the first monolayer 210 a of the first dopant species Ax, the wafer 55 is moved from the reactor chamber 50 a, through a gas curtain 300 (FIG. 2), to the reactor chamber 50 b, by the loading assembly 60 (FIG. 1) and in the direction of arrow B1 of FIG. 2. It is important to note that the gas curtain 300 provides chemical isolation between adjacent deposition regions.
The loading assembly 60 moves the wafer 55 through the gas curtain 300, onto the suscepter 140 b situated in the reactor chamber 50 b, which, in contrast with the reactor chamber 50 a, contains no dopant source and no dopant species. A heater assembly 150 b is positioned under the suscepter 140 b to facilitate the diffusion of the dopant atoms from the newly deposited first monolayer 210 a of the first dopant species Ax into the wafer 55. The heat from the heater assembly 150 b drives the dopant atoms into the wafer 55 and further redistributes the dopant atoms from the first monolayer 210 a deeper into the wafer 55 to form a doped region 210 b of the first dopant species Ax. During this step, the surface concentration of dopant atoms is reduced and the distribution of dopant atoms continues, so that a precise and shallow doping distribution in the doped region 210 b of the wafer 55 is obtained. Accordingly, the depth of the doped region 210 b of the wafer 55 is controlled, first, by the repeatability of the atomic layer deposition for the monolayers of dopant species and, second, by the degree of diffusion of dopants form the monolayers of dopant species into the wafers.
Alternatively, a plasma of a non-reactive gas may be used to complete the diffusion of the dopant atoms into the doped region 210 b of the wafer 55. In this embodiment, a supply inlet 160 b (FIG. 2), which is further connected to a non-reactive gas supply source 162 b, for the plasma of the non-reactive gas, is mounted on the upper wall of the reactor chamber 50 b. An exhaust inlet 180 b, connected to an exhaust system 182 b, is further situated on the opposite wall to the non-reactive gas supply inlet 160 b.
Next, the non-reactive gas By is supplied into the reactor chamber 50 b through the non-reactive gas inlet 160 b, the non-reactive gas By flowing at a right angle onto the deposited first monolayer 210 a of the first dopant species Ax. This way, particles of the non-reactive gas By “knock” the dopant atoms from the first monolayer 210 a of the first doping species Ax into the wafer 55 to form the doped region 210 b of the wafer 55.
Following the formation of the doped region 210 b of the wafer 55, the process continues with the removal of the wafer 55 from the reactor chamber 50 b, through the gas curtain 300, and into the reactor chamber 50 a to continue the doping process. This process is repeated cycle after cycle, with the wafer 55 traveling back and forth between the reactor chamber 50 a, and the reactor chamber 50 b, to acquire the desired doping profile of the region 210 b.
Once the desired doping profile of the wafer 55 has been achieved, an anneal step in the atomic layer doping process is required, to restore any crystal damage and to electrically activate the dopant atoms. As such, annealing can be achieved by a thermal heating step. However, the anneal temperature must be preferably below the diffusion temperature to prevent lateral diffusion of the dopants. Referring to FIG. 2, the anneal step could take place in the reactor chamber 50 b, for example, by controlling the heat from the heater assembly 150 b. Alternatively, the anneal step may take place into an adjacent reactor chamber, for example reactor chamber 52 a, depending on the processing requirements and the desired number of wafers to be processed.
By employing chemically separate reactor chambers for the deposition process of species Ax dopant and possibly others, the present invention has the major advantage of allowing different processing conditions, for example, deposition or diffusion temperatures, in different reactor chambers. This is important since the chemisorption and reactivity requirements of the ALD process have specific temperature requirements, in accordance with the nature of the precursor gas. Accordingly, the apparatus of the present invention allows, for example, reactor chamber 50 a to be set to a different temperature than that of the reactor chamber 50 b. Further, each reactor chamber may be optimized either for improved chemisorption, reactivity or dopant conditions.
The configuration of the atomic layer doping apparatus illustrated above also improves the overall yield and productivity of the doping process, since each chamber could run a separate substrate, and therefore, a plurality of substrates could be run simultaneously at a given time. In addition, since each reactor chamber accommodates only one dopant species, cross-contamination from one wafer to another is greatly reduced. Moreover, the production time can be decreased since the configuration of the apparatus of the present invention saves a great amount of purging and reactor clearing time.
Of course, although the doping process was explained above only with reference to the first substrate 55 in the first chamber reactor 50 a and the second chamber reactor 50 b, it is to be understood that same processing steps are carried out simultaneously on the second and third wafers 55′, 55″ for their respective chamber reactors. Further, the second and third wafers 55′, 55″ are moved accordingly, in the directions of arrows A2, B2 (corresponding to chamber reactors 52 a, 52 b) and arrows A3, B3 (corresponding to chamber reactors 54 a, 54 b). Moreover, while the doping process was explained above with reference to only one first substrate 55 for the first and second reactor chambers 50 a, 50 b, it must be understood that the first and second reactor chambers 50 a, 50 b could also process another first substrate 55, in a direction opposite to that of processing the other first substrate. For example, if one first substrate 55 travels in the direction of arrow B1 (FIG. 2) the other first substrate 55 could travel in the opposite direction of arrow B1, that is from the second reactor chamber 50 b to the first reactor chamber 50 a.
Assuming a specific doping concentration is desired on the wafer 55, after the diffusion of the dopant atoms from the first monolayer 210 a in the reactor chamber 50 b, the wafer 55 is then moved back by the assembly system 60 to the reactor chamber 50 a, where a second monolayer of the first dopant species Ax is next deposited over the first monolayer of the first dopant species Ax. The wafer 55 is further moved to the reactor chamber 50 b for the subsequent diffusion of the dopant atoms from the second monolayer of the first dopant species Ax. The cycle continues until a desired doping concentration on the surface of the wafer 55 is achieved, and, thus, the wafer 55 travels back and forth between reactor chambers 50 a and 50 b. As explained above, the same cycle process applies to the other two wafers 55′, 55″ that are processed simultaneously in their respective reactor chambers.
Although the invention is described with reference to reactor chambers, any other type of doping regions may be employed, as long as the wafer 55 is positioned under a flow of dopant source. The gas curtain 300 provides chemical isolation to all adjacent deposition regions. Thus, as illustrated in FIGS. 2-3, the gas curtain 300 is provided between the two adjacent reactor chambers 50 a and 50 b so that an inert gas 360, such as nitrogen, argon, or helium, for example, flows through an inlet 260 connected to an inert gas supply source 362 to form the gas curtain 300, which keeps the first dopant gas Ax and the non-reactive gas By from flowing into adjacent reaction chambers. An exhaust outlet 382 (FIG. 2) is further situated on the opposite wall to the inert gas inlet 260. It must also be noted that the pressure of the inert gas 360 must be higher than that of the first dopant gas Ax and that of the non-reactive gas By, so that the two doping gases Ax, By are constrained by the gas curtain 300 to remain within their respective reaction chambers.
FIG. 3 illustrates a cross-sectional view of the apparatus 100 of FIG. 2, with same adjacent reactor chambers 50 a and 50 b, but in which the inert gas 360 shares the exhaust outlets 180 a and 180 b with the two doping gases Ax and By, respectively. Thus, the atomic layer doping apparatus 100 may be designed so that the inert gas 360 of the gas curtain 300 could be exhausted through either one or both of the two exhaust outlets 180 a and 180 b, instead of being exhausted through its own exhaust outlet 382, as illustrated in FIG. 2.
FIG. 4 shows another alternate embodiment of the apparatus in which the gas curtain 300 separating adjacent chambers in FIGS. 2-3 is replaced by a physical boundary, such as a wall 170 having a closeable opening 172. A door 174 (FIG. 4) can be used to open and close the opening 172 between the adjacent paired chambers 50 a, 50 b. This way, the wafer 55 can be passed between the adjacent chambers 50 a, 50 b through the open opening 172 by the robot 60, with the door 174 closing the opening 172 during atomic layer doping processing.
Although the present invention has been described with reference to only three semiconductor substrates processed at relatively the same time in respective pairs of reaction chambers, it must be understood that the present invention contemplates the processing of any “n” number of wafers in their corresponding “m” number of reactor chambers, where n and m are integers. Thus, in the example shown in FIG. 1, n=3 and m=6, providing an atomic layer doping apparatus with at least 6 reaction chambers that could process simultaneously 3 wafers for a repeating two-step atomic layer doping using Ax as a dopant source and By as a non-reactive gas for diffusion. It is also possible to have n=2 and m=6 where two wafers are sequentially transported to and processed in the reaction chambers for sequential doping with two species, for example, Ax and a second dopant species Cz, while employing the non-reactive gas By to facilitate the diffusion of the dopant atoms Ax and Cz. Other combinations are also possible. Thus, although the invention has been described with the wafer 55 traveling back and forth from the reactor chamber 50 a to the reactor chamber 50 b with reference to FIG. 2, it must be understood that, when more than two reactor chambers are used for doping with more than two monolayer species Ax, Cz, the wafer 55 will be transported by the loading assembly 60 among all the reaction chambers in a sequence required to produce a desired doping profile.
Also, although the present invention has been described with reference to wafers 55, 55′ and 55″ being selectively moved by the loading assembly 60 to their respective reactor chambers 50 a and 50 b (for wafer 55), 52 a and 52 b (for wafer 55′), and 54 a and 54 b (for wafer 55″), it must be understood that each of the three above wafers or more wafers could be sequentially transported to, and processed in, all the reaction chambers of the apparatus 100. This way, each wafer could be rotated and moved in one direction only. Such a configuration is illustrated in FIG. 5, according to which a processing cycle for atomic layer deposition on a plurality of wafers 55, for example, begins by selectively moving each wafer 55, from the loading assembly 60 to the chamber reactor 50 a, in the direction of arrow A, (FIG. 5), and then further to the reactor chamber 50 b, 52 a, 52 b, 54 a, and 54 b. One reaction chamber, for example 50 a, can serve as the initial chamber and another, for example 54 b, as the final chamber. Each wafer 55 is simultaneously processed in a respective chamber and is moved sequentially through the chambers by the loading assembly 60, with the cycle continuing with wafers 55 traveling in one direction to all the remaining reactors chambers. Although this embodiment has been described with reference to a respective wafer in each chamber, it must be understood that the present invention contemplates the processing of any “n” number of wafers in corresponding “m” number of reactor chambers, where n and m are integers and n≦m. Thus, in the example shown in FIG. 5, the ALD apparatus with 6 reaction chambers could process simultaneously up to 6 wafers.
The above description illustrates preferred embodiments that achieve the features and advantages of the present invention. It is not intended that the present invention be limited to the illustrated embodiments. Modifications and substitutions to specific process conditions and structures can be made without departing from the spirit and scope of the present invention. Accordingly, the invention is not to be considered as being limited by the foregoing description and drawings, but is only limited by the scope of the appended claims.
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|U.S. Classification||438/428, 438/558, 257/E21.148|
|International Classification||H01L21/205, H01L21/00, H01L21/225, H01L21/265, H01L21/22, H01L21/677|
|Cooperative Classification||H01L21/6719, H01L21/2254, H01L21/67167, H01L21/67745, H01L21/67213, H01L21/67207|
|European Classification||H01L21/67S2Z10, H01L21/67S2Z10B, H01L21/67S2Z2C, H01L21/67S2Z6, H01L21/677B4, H01L21/225A4|
|Sep 21, 2007||FPAY||Fee payment|
Year of fee payment: 4
|Sep 19, 2011||FPAY||Fee payment|
Year of fee payment: 8
|Nov 25, 2015||FPAY||Fee payment|
Year of fee payment: 12
|May 12, 2016||AS||Assignment|
Owner name: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGEN
Free format text: SECURITY INTEREST;ASSIGNOR:MICRON TECHNOLOGY, INC.;REEL/FRAME:038669/0001
Effective date: 20160426
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Owner name: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL
Free format text: PATENT SECURITY AGREEMENT;ASSIGNOR:MICRON TECHNOLOGY, INC.;REEL/FRAME:038954/0001
Effective date: 20160426

domain: chemistry


text:
One of the benefits of my job is that I get to work with young men and women all day, except when I’m not, when I’m puttering about with spiders (we will pretend committee meetings do not happen). So this morning I had my coffee and then toddled off to the lab to tend to my little friends.
Here’s my breeding colony.
They’re the ones with special privileges. They get the big roomy 5.7L sterilite containers, with one female per cage and connubial visitations. There are also racks in a pair of incubators with about 50 more spiders living in 3cm diameter tubes; they seem content, as long as food keeps getting delivered. So some of the spiders get to live in a suite at the Hilton, others are in the capsule hotel.
The larger cages have these cardboard frames inside, made from the boxes for soda pop mini-cans, which just happen to about the right size. We just cut out the sides. These frames are what they build their cobwebs on, and also provide dark corners to hide in when they want to be left alone, although often they’ll be hanging upside down in the webs, waiting for food.
One nice thing about the cardboard frames is you can just pull them out to get access to the inhabitants, without disrupting their webs too much. They’ll usually just sit there while you freely rotate the frame and get a good look at them — they don’t try to run away, because the cobweb is their safe place. If you get too close they’ll panic, which usually means dropping straight down on a drag line, so as long as you hold the frame over the cage, they’re not going to escape.
In the next photos, if you see some big pink things, those are just my fingers out of focus in the background. The spiders don’t care. I’m not prey and I’m not threatening them, so there is no risk.
This is Lyanna, suspended in space. There is a lovely lacy cobweb everywhere in the frame, and she is poised delicately, limbs in a characteristic pose, ready to race to capture any small arthropod that gets tangled. She’ll also drop down to any untangled fly passing by and trap it and haul it back up to the web.
I tried to spin it around to get a good shot of her face, and you can see her palps and chelicerae. Didn’t get a good view of her eyes, though.
One thing you can see is her color, a lovely brown with darker mottlings, and bands around the joints of her limbs. That varies a lot in different individuals. This next female, Spiderzilla, is about twice the size of Lyanna, and has much darker pigmentation (also, this photo does have her pretty eyes in focus).
One of my planned wintertime projects is to document pigment patterns and intensity in the next generation of spiders (not this one, because these are all wild-caught and who knows who they mated with), and look for variations to see if they breed true or are more a random product of environment and food types. I’m just going to have to find a student or two who wants to do that…


text:
Conceived loosely by Berlin based Glenn Astro and Cologne's Hodini, Turquoise Tortoise was not your typical collaboration. As Astro explained, they had the idea of working together for a a long time, but with them living on opposite sides of the country - it was rather difficult to get into the studio. They exchanged their respective takes of each track via the internet. The album's title is quite the metaphor, describing the slow pace of a tortoise to explain how the processes moved forward during the process of recording. The album features Astro's fellow Money $ex comrade Max Graef on the blunted urban flavour of "Malaysian Moped" and Hodini's experience with working with vocalists was said to pay off - you can hear it on the collaborations with Ajnascent on the hazy and susted down soul jam "Found!" or the evocative nu-jazz number "Beautiful Music" featuring MC Pinty.
What is Album Only?
Some artists and labels prefer certain tracks to be purchased as part of an entire release. These tracks cannot be purchased individually but are available to download as part of the release


text:
You will need … 2 pounds potato (yukon gold or russet), 1 1/4 cups all-purpose flour, 1 egg yolk, and a pinch of salt.
1. Scoop the insides out of baked potatoes and press through a potato ricer, use a food mill, or mash by hand until smooth.
2. Gather the potato into a mound on the counter, sprinkle with salt and let cool (about 15 minutes).
3. Make a well in the potato, pour egg yolk over cooled potatoes, and sprinkle with flour.
4. Gently fold the flour and egg into the potatoes until combined.
5. Gently squeeze, kneed, and pat the dough until it holds together and resembles a biscuit dough or cookie dough (the dough will be a little sticky). Do not overwork. Add a little more flour if too sticky.
6. Pat the dough into a 1 1/2 inch thick disk and divide unto 4 equal pieces.
7. On a lightly floured surface, roll each portion into a long “snake” (1/2 to 3/4 inch wide).
8. Cut the dough “snake” into 3/4-inch pieces.
9. Use fingertip to make an indentation in the center of each gnocchi.
10. Boil water. Place gnocchi into boiling water – when they float to the top, remove from pot.
11. Serve warm – just toss with your favorite sauce and enjoy!

domain: food


text:
For the second straight game, Michigan basketball will face a team that starts two traditional post players. The Tennessee Volunteers feature two 6’8’’ players in their frontcourt. Jarnell Stokes and Jeronne Maymon have been dominant on the boards in their three tournament games, pulling in a combined 23.7 rebounds. They also combine for 28 points, but this is less worrisome than their rebounding statistics.
Michigan isn’t a stranger to playing teams with more size. The Texas Longhorns also had a couple of behemoths down low, but Michigan was able to limit their impact. Cameron Ridley and Jonathon Holmes scored a 15 combined points, which Jordan Morgan was able to score by himself. However, the two posts each grabbed nine rebounds as the Longhorns outrebounded the Wolverines 41-30.
A big reason for the discrepancy was Michigan’s lack of size on the inside. Morgan and Glenn Robinson III are elite defenders, but they often give up a couple of inches and twenty pounds to other players.
Morgan has made the most of his talent through work ethic, getting in suberb shape this season. The center position is not that big of a concern.
However, the power forward has been interesting position for Beilein during his time at Michigan. On offense, players like Zack Novak and Robinson have functioned essentially as wings, and rarely find themselves on the block. On defense, the players usually have to guard players bigger than them.
Before the season, John Beilein said that Robinson would be installed at the small forward position, his natural position. Due to the emergence of Caris LeVert, Beilein went back to the norm: trying to get all of his best players onto the court.
Robinson accepted moving back to the four, and it was clear that Michigan’s offense worked much better with him there. However, it also came with a consequence: Michigan finished 303rd in the nation in rebounds per game.
It raises an interesting question for next year: how will Michigan utilize the power forward slot? Jordan Morgan will be gone, and Robinson and McGary may return to school after falling out of the first round on many mock drafts.
If Robinson returns, Beilein will most likely use him again at the four. The sophomore is too athletic and too good of a shooter to keep off the floor, and Beilein will again try to get all of his best players on the floor. Michigan has had one of the most efficient offenses with this formula, and who would argue with a lineup of McGary, Robinson, LeVert, Nik Stauskas or Zak Irvin, and Derrick Walton?
If McGary and Robinson leave, things get a little more interesting. Senior-to-be Jon Horford would be the starter at the center position, but the power forward slot would be up for grabs.
Redshirt freshman Mark Donnal would be the likely starter. The Ohio native is more of a traditional post player at 6’9’’ and 235 pounds, but has shooting range out to the three point line. He lacks Robinson’s speed and athleticism, but could offer an upgrade for post defense.
Beilein would likely redshirt incoming 6’9 post player Ricky Doyle, instead offering Max Bielfeldt backup minutes. Beilfeldt, known as the Moose, is a solid shooter and a wide body in the post. The 6’9’’ redshirt sophomore played great defense against Stanford and Michigan State when Horford and Morgan got into early foul trouble.
It all depends on Michigan’s personnel next year, but the power forward position could be drastically different on defense. In a traditional, stretch four like Donnal, Beilein may have found a bigger player to bang down low while being able to play on the perimeter on offense.


ACUS 8 SIMON 200 Watt Acoustic Amp
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The versatility of this model is enhanced by an AUX input with dedicated volume control and 2-band EQ; two direct outputs (LINE and REC) and a manual "feedback canceller" filter.
The headphone output with dedicated volume control and eight high-quality digital effects round out the multi-faceted feautures of the system.
Max Power Out
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40Hz - 20kHz
2 way biamp.
2 way bass reflex


Tech world’s notorious leaker Steve Hemmerstoffer has leaked what he apparently identifies as the upcoming iPhone 5se.
As per the rumors, iPhone 5se will have identical specifications and features to that on the iPhone 6 but the design will most probably be inspired by the older iPhones. Out of all, one thing that can be counted upon is that the phone will sport a 4-inch screen.
Just like that on the 5 and the 5S, the oval home screen button will make a comeback while nothing is still very clear about the placement of the volume rockers, charging port and the earphone jack.
Photo: © fastcompany (Main Image)


text:
botanist and Barrel
ABOUT Botanist and Barrel
Cedar Grove, NC is a quaint little township just north of Hillsborough. It’s a farming community that once focused on tobacco, but is slowly shifting to fruits and veggies, especially apples and blueberries. On Cedar Grove Blueberry Farm is Botanist and Barrel, a farmhouse cider and winery focused on natural ciders and wines. “The soul of the farm is its soil,” says Lyndon Smith, one of the owners. Its sandy loam soils are rich with perfect drainage for blueberries and apples. The farm is certified organic, “never spray” and is also dry-farmed, meaning we don’t irrigate. As a result the fruits are bursting with flavor and terroir. “These' are the best berries on earth,” says Smith.
To highlight the true terroir of the farm, we capture the wild yeasts from the bloom of the blueberries and ferment some of our beverages with native yeast. “using native yeast just highlights the sense of place,” says Kether Smith, cidermaker and co-founder. “We wholesale and do lots of collarborations with other producers and our berries always shine through. You know they are from Cedar Grove,” says Amie Fields.
As certified organic farmers, we value quality over quantity. Similar to world-class viticulture for wines, we farm for flavor by dry-farming. While this keeps yields down, it keeps quality up. We partner with other farmers who share our belief. As fruits contain a 'bloom,' the powdery white coating found on fruit that contains ambient yeast. We love this natural and wild yeast and have isolated and banked our farm's wild blueberry yeast to create unique and lovely ciders.
Our ciders are made without additives. They are 'still alive' as we never kill or remove the mixed cultures (yeasts) through unneeded processing. We choose not to fine, filter, or pasteurize.

domain: agronomy


text:
Keunho Peter Park likes to make containers for atypical objects; sound, space, and the human body. That is to say he creates furniture, musical instruments, and vessels, vessels that are cradles for emptiness. His stools and chairs are fashioned with comfort in mind, exhibiting a dry wit and edgy sense of humor that transforms these containers for the body into living beings in their own right. The subtle animus that emanates from these ligneous entities gently changes the character of an empty room, from absence to presence.
His studio's name, Studio Spong, comes from the comic book character Spawn, "who is the lonely leader of hell with cool super powers and such."


text:
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Authorities say a 9-year-old boy was shot in the head while his father said he was cleaning a handgun inside their central Indiana home.
Multiple fire crews responded to a fire early Thursday morning that destroyed the Better Way Products fiberglass plant and blocked early morning traffic.
South Bend community activist Isaac Hunt had trial dates set for the charges he faces for an Oct. 10 domestic disturbance, but remains in custody due to a violation of his Direct Placement agreement from a previous sentence.
Authorities say a stun gun found on a school bus in southeastern Michigan was apparently given to the driver by her boyfriend for protection.
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Wolverine Power Cooperative plans to build a more than $100 million natural gas-fueled power plant in Michigan's northern Lower Peninsula.
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Unnai Thavira Veru Illai Velayudhane Shanmugane Yen Indha Thamadham Meenakshi Yendraikku Siva Krupai. Abhirami Pancharathnam (Five Gems on Abhirami) By Sage Neelakanta Sivan Translated by P. R. Ramachander Ragamalika (Sage Neelakanta Sivan was a great composer belonging to South Travancore and lived at the end of 19th century. Though a very.
Kandhar Alankaram. From Hindupedia, the Hindu Encyclopedia. Jump to:navigation, search. By Swami Arunagirinatha Transliteration By Elango Kadhirvel Translated By P.R.Ramachander. This work was written by Sanit Arunagirinatha, the author of Thirupugazh, which is considered as one of the greatest poem collections praising Lord Subrahmanya. Arunagiri was born in Thiruvannamalai, a town in Tamil.
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