text:
Do you feel like relaxing on Ascension Day? With over 90 unique 3- and 4-star Fletcher Hotels in Nederland, there are plenty possibilities. Nature lovers can enjoy the stunning nature and others the beautiful surrounding cities. Take wonderful cycling or hiking trails and discover the netherlands during a weekend getaway. Find some peace and quiet in the comfortable hotel rooms. You will not miss out on anything.
This package includes:
- Reception with welcome drink and regional speciality
- 1 x overnight stay
- 1 x continental breakfast buffet
- 1 x luxurious 3-course Ascension dinner at the day of arrival
- Information pack about the local area including cycling and walking routes
Select a date
Click on the calendar to select a check-in date. Prices below are per person per package.
- Authentic Saxon hotel
- Near the vibrant city of Groningen
- Charming Restaurant De Broeierd
Fletcher Hotel-Restaurant De Broeierd-Enschede was built in authentic Saxon style and is located on the outskirts of Enschede. The new, 4-star hotel is the perfect location to start taking in all the wonderful experiences Twente as to offer. Discover the stunning natural areas and their extensive cycling and hiking routes, the quaint villages and historic sites. This luxurious hotel features a welcoming bar, a gorgeous terrace for whiling away your time and spacious, comfortable hotel rooms for a carefree stay. Allow yourself to be amazed by the culinary creations of the head chef at Restaurant de Broeierd.
- Bike rental
- E-bikes rental
- Free parking
- Free WiFi
- Banquet halls

domain: travel


text:
On the 7th of May the whole school community enjoyed the summer concert „Film & Musical Night“, professionally organized by our music teacher André Reichel. All the presents were amazed by the performances of the students from class 1 to 9. We can’t wait for the next concert!
A really wonderful afternoon!
Get together, singing, listening to performances, buying great things and enjoying goodies – What more could you wish for?
Thanks to all diligent helpers, teachers, students and children for the loving preparation and wonderful performances, thank you for your visit, Mr. Ambassador Muzel and thanks for the great performances of the Doha Youth Choir and the Doha Chamber Choir. Of course, we also thank all the guests and the sellers for being there and all the parents for baking and bringing the buffet. Last but not least, our special thanks to the new school parents representatives Julia Whyte and Nermine Hashish, who have mastered a very important task of their position: the entire organization of the bazaar! Bravo!
This post is also available in: German

domain: artistic


Ranking Member Deutch Applauds House Passage of Taylor Force Act
Congressman Ted Deutch (FL-22), Ranking Member of the Middle East and North Africa Subcommittee, issued this statement after the U.S. House of Representatives unanimously passed the Taylor Force Act (H.R. 1164):
“We need trusted partners for peace in the Palestinian Authority. That starts by ending the subsidy program for acts of terrorism. I’m proud that Congress came together to produce a strong bipartisan bill to finally pressure the Palestinian Authority to stop their ‘pay for slay’ practice. Rather than encouraging violence against Israelis, the Palestinian leadership should rally the Palestinian people toward peace with Israel by resuming direct negotiations.”
Click the image below to watch Congressman Deutch's floor statement:
The House Foreign Affairs Committee unanimously passed the Taylor Force Act on November 15. His statement following that vote can be found here.


text:
When you first start playing golf your clubs are probably a mish-mash of hand me downs from whoever taught to you to play. At some point you will want to get a complete set of your own clubs so you can get better at the game. Buying your first set of clubs is a milestone of sorts and no matter how long you play the game you will remember your first set of clubs. Before you go shopping you should know what goes into a complete set and what things you should look for.
A Complete Set of Clubs
Buying a complete set of clubs should consist of anywhere from 14-16 clubs in total, although a beginners set may have a few less. Here is a list of clubs that should be in a complete set.
- A putter
- A driver
- Irons (anywhere up to 6 different irons)
- Woods (up to three different clubs)
- Wedges (at least 2, one for sand and 1 for pitching)
Now let’s take a look at what each does and when you will use them.
Irons are used as you go through the course and need to take shorter shots. Irons come in two different types: the forged blade and the cavity back blade, as a beginner you should start with the cavity back blade. Opt for graphite shafts, it helps a beginner with their accuracy and as your game improves you might want to transition to a stiffer shaft.
Woods are a better choice when you need to make some longer shots. Select woods that come with bigger heads it will help keep your shots straight and accurate on the course.
Every set of clubs absolutely needs a putter, they are vital on the green and you will use them on approach shots too. You can start your set with one but as you get better at the game you may end up with a couple of them.
As a beginner you will use your wedges a lot, particularly the sand wedge. Wedges are ideal for getting out of the sand and shots where a putter isn’t enough and wood is too much.
Lastly we come to drivers, they are used when you begin the game or the next hole. They are used to “drive” the ball as far as you can on the course. Most pros only have the one driver in their bag.
Golf is a game where you will spend most of the time competing against yourself even when you are playing against others. Good equipment is crucial to improving your game and getting to the next level.

domain: game


text:
A teacher made his initial appearance in U.S. District Court in Rome after being charged with the distribution and possession of child pornography.
Raymond “Robin” Watts, 55, of Kingston, was caught providing numerous images of child pornography to an undercover agent who made contact with him in early 2011. Hundreds of sexually explicit images of children were found on his home computer after a search warrant was executed. Law enforcement discovered most of the children were minor boys.
U.S. Attorney Sally Quillian Yates said the children in the community must be protected.
“Although all child pornography cases are tragic because of their victims, this case was even more troubling because the defendant taught in a middle school where he had daily interaction with children,” Yates said.
The investigation is ongoing and Yates encouraged anyone with information to contact U.S. Immigration and Customs Enforcements at 1-866-DHS-2-ICE or the .
Watts is scheduled to have his arraignment and bond hearing before a U.S. Magistrate Judge this Tuesday at 2:30 p.m.

domain: news


|Publication number||US6304316 B1|
|Application number||US 09/176,920|
|Publication date||Oct 16, 2001|
|Filing date||Oct 22, 1998|
|Priority date||Oct 22, 1998|
|Publication number||09176920, 176920, US 6304316 B1, US 6304316B1, US-B1-6304316, US6304316 B1, US6304316B1|
|Inventors||Kanti Jain, Nestor O. Framiga, Thomas J. Dunn|
|Original Assignee||Anvik Corporation|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (7), Referenced by (56), Classifications (15), Legal Events (8)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This invention relates to microlithography, and more particularly relates to a projection microlithography system for high-resolution patterning on a large-area, photo-sensitive substrate having planarity deviations that exceed in magnitude the depth-of-field parameter of the projection imaging optics of the lithography system.
Large-area electronic, mechanical and electromechanical structures on curved surfaces with integrated functional capability are rapidly growing in significance in a number of applications. In the military environment, this is evidenced by the desire for faster, lighter, and greater-functionality hardware, requiring active electronic circuitry and/or large-area micromechanical structures such as sensors and actuators. In the commercial sector, the availability of active microelectronic devices and micromechanical structures on large surfaces, especially those printed conformably on curved surfaces, holds enormous promise for applications in communications, integrated sensors and controls, and medical sectors. Technologies currently do not exist to produce such devices and structures.
As the level of functionality in a microelectronic or micromechanical device or structure increases, it becomes more important to develop manufacturing technologies and systems that will enable large-area printing on curved substrates at a reasonable cost. The curvature of the substrate may be predetermined and well defined, e.g., a spherical shell of known radius, or it may be random and unknown, e.g., a random, two-dimensional topography variation combining concave and convex regions. Existing approaches are unattractive because they provide very low throughputs (e.g., electron-beam or other focused-beam direct writing), or involve expensive additional process steps (e.g., chemical-mechanical polishing), or have a short depth of focus, and they cannot print conformably (e.g., all existing optical projection lithography techniques). This invention discloses a new lithography technology that enables conformable patterning with high resolution and high throughput on large-area substrates which may have curvature in one or more directions.
In the manufacturing of electronic devices and modules, the production equipment represents a major cost element, accounting for approximately two-thirds of the total facility cost. Of the many process steps involved in the fabrication of such devices, the most critical are those required for successively patterning various layers of photoresist and other materials. The capabilities and cost-effectiveness of the lithography technology impact the performance and cost of the device, and ultimately determine the size and cost at the end-system level. This makes patterning tools the largest and most critical component of the total production equipment investment. Typical costs of individual tools range between $2 and 5 million. A high-volume production facility would have multiple lithography tools. In addition, operating expenses add several hundred thousand dollars per year to the net cost of running such tools. Thus, in order to make significant progress toward broad realization of greater-functionality electronic and mechanical systems, there is a need to develop and implement new high-resolution, high-throughput lithography equipment for conformable patterning on curved, large-area surfaces.
Currently available exposure systems can be classified into four general categories: (a) contact and proximity printing systems, (b) various types of projection systems (conventional, step-and-repeat, and scanning), (c) focused-beam direct-writing systems, and (d) holographic imaging systems. Each of these will be briefly described below. A contact printer consists of a fixture to align and hold the substrate in hard contact with the mask which is then illuminated with high-intensity collimated light to transfer the mask image to the substrate. In a proximity system a uniform gap is maintained between the mask and the substrate. Most contact printers use one or two mercury arc lamps, with powers in the range 2-8 kW. The radiation used for exposure is in the UV region from ˜250 nm to ˜430 nm, the rest of the light in the visible and the infrared being filtered away to minimize heating. The useful UV power represents less than 1% of the total wattage, indicating the extremely poor utilization efficiency of such lamp sources. A major limitation of contact printing is generation of defects on the substrate due to repeated contacting of the resist-coated surface, which results in lower yields. Frequent mask-substrate contact also degrades the mask life, which leads to higher overall costs. These problems are somewhat less severe in proximity printing. However, since the resolution R in a proximity system using radiation of wavelength λ depends on the mask-substrate gap d, as given by R=(λd/2)½, any nonuniformity in the gap results in feature size variation. This limitation becomes more severe for larger panels as it becomes more difficult to maintain a uniform gap between the mask and the substrate. Finally, neither contact nor proximity lithography tools can print on curved surfaces.
A variety of projection imaging systems are used in fabrication of microelectronic modules.
Single-field, or conventional, projection tools are those in which the image field of the lens is sufficient to accommodate the entire substrate. Typically, a projection lens with a 1:1 magnification is used. For different design resolutions, the maximum image field size of the projection lens is different: whereas a 1 mil resolution can be obtained over a 4 inch square field, the imageable area for 1 micron resolution must be limited to a field diameter no larger than 2-3 cm. Thus, conventional projection printing systems are limited by the fundamental trade-off between the desired resolution and the largest substrate they can image.
In a step-and-repeat type of projection system the total substrate area to be patterned is broken up into several segments which are then imaged one at a time by stepping the substrate under the lens from one segment to the next Due to the increased overhead from the stepping, settling and aligning steps for each segment, steppers deliver low throughputs. Most step-and-repeat systems use reduction imaging, typically with a 2:1, 5:1 or 10:1 ratio. Generally, systems with larger reduction ratios provide higher resolution, but also lower throughput. Steppers also have a performance shortcoming due to stitching errors between adjacent exposure segments. When a stepper is used for semiconductor chip lithography, the individual chip sites are separated by nonimaged areas (‘streets’) through which the chips are diced. Since these streets contain no patterns, there is no requirement to precisely stitch adjacent segments together. However, in a large panel, as for a circuit board or a display, the entire substrate is often one pattern; there are no un-imaged areas between segments. The segments, therefore, must be butted next to each other with great precision. Poor lithography due to stitching errors is one of the most significant yield detractor in the production of large-area products. Recognizing the throughput limitations of steppers, many types of scanning projection tools have been developed over the last two decades. The most well known of these use a reflective ring-field imaging system. Exposures are made by scanning the mask (and the substrate) across an illumination beam in the shape of an annulus, which is necessitated by the geometry of the zone of good image correction. The scanning ring-field imaging concept requires primary imaging mirrors that are approximately three times larger than the size of the substrate. As a result, such scanners, although capable of good resolution, are extremely expensive and incapable of handling most large panel sizes. Their throughputs are also low. Another class of scanning systems use a modified Dyson-type imaging system employing a large beamsplitter, a reduction ratio of 4:1, and separate mask and substrate stages traveling at velocities in the same ratio. These systems, while capable of resolution down to 0.25 μm, have an individual chip-field-size limitation of ˜7 cm2, and have prohibitively high system costs—approaching $10 million. In addition, all projection lithography tools are limited in their ability to image on curved surfaces—the departure from flatness can be no more than the depth of focus.
A focused-beam direct-writing system uses a laser in a raster scanning fashion to expose all the pixels, one at a time, on the substrate. To be compatible with the spectral sensitivity of common photoresists, typically an argon-ion laser operating at one or more of its UV or blue wavelengths is employed. The laser beam is focused on the resist-coated substrate to the desired spot size. The focused spot is moved across the substrate in one dimension with a motor-driven scanning mirror. In conjunction, the stage holding the substrate is translated in the orthogonal dimension with a high-precision stepping motor. Simultaneously, the laser beam is modulated (typically, acousto-optically) to be either directed to the desired location on the substrate or deflected away. Thus, by driving the modulator and the two motors with appropriately processed pattern data, the entire substrate can be directly patterned. Of the many focused-beam direct-write systems currently available, the offered resolution varies from several microns for board patterning to under a micron for systems designed for mask-making applications for IC lithography. Since transfer of the pattern information by such tools takes place in a slow, bit-by-bit serial mode, typical substrate exposure times can range from 2 minutes to several hours per sq. ft., depending upon the resolution and the complexity of the pattern data. Direct-write systems, therefore, are suitable only for applications such as mask fabrication and prototyping, and highly unattractive for cost-effective volume manufacturing.
Holographic imaging systems utilize a mask which is a hologram of the pattern to be imaged, such that when “played back”, it projects the original pattern onto the substrate. The mask is generated by encoding the diffraction pattern from a standard mask in a volume hologram. Generally, for all but the simplest patterns, fabrication of the holographic mask requires numerous processing steps. In a holographic lithography system, the burden of imaging is placed entirely on the mask. Holographic imaging systems suffer from poor diffraction efficiency and are applicable, at best, for imaging of very periodic patterns of not very high resolution. If the pattern is not periodic, the imaging resolution degrades. Holographic masks are also considerably more expensive to generate, which is made further prohibitive when masks for many different layers are required for the substrate.
Large-area exposure systems that eliminate all of the above limitations have been described by this inventor in his previous patents, including: U.S. Pat. No. 4,924,257, Scan and repeat high-resolution lithography system, issued May 8, 1990; U.S. Pat. No. 5,285,236, Large-area, high-throughput, high-resolution projection imaging system, issued Feb. 8, 1994; and U.S. Pat. No. 5,652,645, High-throughput, high-resolution, projection patterning system, issued Jul. 29, 1997. In these patents, the inventor has described exposure systems that can pattern large substrates by an efficient seamless scanning technique. The illumination system is designed to produce a hexagonal exposure region. Seamless joining of scans is achieved by partial overlap between adjacent scans, which produces a uniform exposure of the entire panel due to integration of complementary intensity profiles. The systems described in these prior patents are attractive for patterning substrates which can be rigid or flexible, and be in the form of discrete panels or as a continuous sheet-roll fed from one roller and taken up by another roller after exposure. However, in all cases, the area being patterned in one exposure operation must be planar, i.e., it must be flat within the limited depth of focus of the projection lens. There is currently no lithography system which can image a substrate whose surface curves in two dimensions and the curvature is orders of magnitude greater than the depth of focus of the projection lens. As already pointed out above, a system that provides the capability to pattern curved substrates will be a significant advantage in the manufacturing of electronic modules. This invention describes such a system.
This invention describes a projection imaging system that can pattern very large, curved substrates at very high exposure speeds and any desired image resolution, the substrates being permitted to have arbitrary curvature in two dimensions. The substrate is held rigidly on a scanning stage, on which is also mounted a mask containing the pattern to be formed on the substrate. The mask is imaged on to the substrate by a 1:1 projection system which is stationary and situated above the scanning stage. The mask is illuminated from below with a hexagonal illumination beam which causes a patterned region of similar shape to be imaged on the substrate. Different regions of the substrate are moved in a direction parallel to the direction of the optical axis at the substrate (z-axis) by suitable amounts to keep the segment being exposed within the depth of focus of the imaging lens. The stage is programmed to scan the mask and substrate simultaneously across the hexagonal regions so as to pattern the whole mask. Suitable overlap between the complementary intensity profiles produced by the hexagonal illumination configuration ensures seamless joining of the scans.
Important novel elements of this lithography system include opto-mechanical mechanisms for moving the substrate in the z-axis and/or configuring the focal plane of the projection lens so as to always keep the substrate segment being exposed within the depth of focus of the lens. The key requirements in the design of these mechanisms are that first, the surface curvature is at each point on the substrate must be determined and second, the substrate must be moved and/or the optical system adjusted such that the substrate region being illuminated is within the depth of focus of the projection lens. This invention describes several embodiments for accomplishing these requirements.
It is thus the object of this invention to provide a high-throughput, high-resolution, projection patterning system for large, curved substrates for production of electronic devices.
It is another object of the invention to provide an exposure system that images large, curved substrates by overlapping seamless scanning using a small-field projection system and a single planar stage assembly.
It is a more specific object of this invention to provide opto-mechanical mechanisms for moving the substrate in a direction orthogonal to its surface and for configuring the focal plane of the projection lens so as to always keep the substrate segment being exposed within the depth of focus of the lens.
A feature of the invention is a functionally integrated implementation of an illumination means to produce a uniform hexagonal illumination, a two-dimensional scanning stage to enable seamless exposure of large, curved substrates, and means to move different regions of the curved substrate to keep each region within the depth of focus of the imaging system.
Another feature of the invention is the provision of a surface profile measurement means to determine the curvature of the substrate surface at each location.
Another feature of the invention is the provision of a variable-focal-plane imaging system capable of fine-tuning the focal plane of the projection lens.
Another feature of the invention is the provision of certain z-axis actuators that enable different regions of the substrate to move by different amounts along the optical axis.
Still another feature of the invention is the provision of a deformable optical element in the imaging system capable of providing a curved focal plane so as to compensate for the curvature of the substrate.
An advantage of the invention is that it provides the ability to pattern large substrates which have a surface curvature in one or more directions, thereby enabling fabrication of electronic modules on non-planar surfaces, e.g., spherical shells.
Another advantage of the invention is that it provides the capability of patterning large substrates with very high throughputs and the desired resolution, thus eliminating the limitations of existing patterning tools.
While the invention has been presented in embodiments incorporating the features described above, other objects, features and advantages of the invention will be apparent to those skilled in the art from the written description and claims and the attached drawings.
FIG. 1 is a schematic illustration of one embodiment of the invention, showing a substrate with a vastly exaggerated curvature mounted in a holder with controlled z-motion capability. The substrate surface is characterized for its topography by a profilometer and is imaged with a projection system incorporating a variable phase plate.
FIG. 2 depicts a prior-art microlithography system, patented by one of the co-inventors of this application, that is capable of large-area projection imaging using a seamless, scan-and-repeat exposure mechanism.
FIG. 3 shows how the seamless scanning technology of prior art works, indicating complementary overlap between adjacent scans carried out with a hexagonal illumination beam.
FIG. 4 illustrates the problem solved by this invention, namely the challenge of imaging on a curved substrate whose deviation from planarity is of greater magnitude than the depth of focus (DOF) of the projection system.
FIG. 5 shows the mapping of the image plane of the projection lens to the substrate. Based on the substrate curvature data determined by the profilometer, the substrate is optimally positioned in the z-direction so that its surface in the exposure region is within the depth of focus (DOF) of the projection lens.
FIG. 6 depicts an embodiment of a fine-tuning means to vary the focal plane of the imaging system. The device shown is a variable phase plate assembly incorporating two wedged plates that slide with respect to each other to provide an adjustable optical path length.
FIG. 7 is a schematic of an embodiment of the invention that includes means to provide variable z-motion capability to the substrate, a variable phase plate assembly for fine focal-plane tuning, and a deformable mirror device to provide a curved image plane. Based on the substrate curvature data determined by the profilometer, the z-motors, the variable phase plate, and the deformable mirror work in combination to provide the optimum mapping of the image plane to the substrate during the entire exposure operation.
FIG. 8 provides a detailed illustration of a deformable mirror, showing the reflective element mounted on an array of piezo electric actuators that adjust individually to produce the desired mirror curvature.
FIG. 9 shows the bridge structure supporting stationary elements above the moving stage.
Table 1 presents the design specifications of a representative lithography system that can be constructed based upon the disclosed invention.
FIG. 1 shows a schematic of the new lithography system for patterning on curved substrates. The substrate 1 and mask 2 are held side-by-side on the same scanning stage 3 and are moved in a series of scans in a serpentine fashion through the object and image fields of the projection lens 5. The imaging path includes a reversing device 6 which ensures that the image on the substrate is in the same orientation as the mask pattern. In order to keep the center of the image field of the lens 5 in focus on the substrate 1, the substrate holder 10 is actuated along the z-direction during each scan. Built into the substrate holder 10 of the scanning stage 3 are a suitable number of motors 11-13 that move the substrate 1 in the z-direction. The motion of the z-motors 11-13 and the scanning action of the stage 3 are synchronized to locate the image field of the projection lens 5 so as to ensure that every point within the image field is within the depth of focus (DOF). Later in this description, we illustrate how the required z-motion is determined.
Before going into further details on the elements of the invention that relate to curved surfaces, we summarize the technology of seamless scanning exposure mechanism that has been described in detail in previous patents (cited above) issued to one of the inventors (K. Jain). As shown in FIGS. 2 and 3 (prior art), the single planar stage 18 (FIG. 1) causes the mask 20 and the substrate 16 to scan in unison along the x-axis across their respective illuminated regions to traverse the length of the substrate 16. The illumination system 4 is designed to produce a hexagonal illumination region on the mask 20 through clear openings in stage 18 and mask holder 9. After a scan, stage 18 moves along the y-axis by an effective scan width (shown as w, 52, in FIG. 3). Now the substrate 16 and mask 20 are again scanned along x as before, after which they are laterally moved along y, and the process is repeated until the entire substrate is exposed. In FIG. 3, the hexagons 36 and 38 represent the illuminated regions on the substrate for scans 1 (50) and scan 2 (54). The y-movement after each x-scan is given by w=1.5 lh, where lh is the side-length of the illumination hexagon. In scan 1, the region swept by the rectangular portion b-g-h-c of hexagon 36 is not overlapped by any portion of scan 2. However, the region swept by the triangular segment a-b-c of hexagon 36 in scan 1 is re-swept in scan 2 by the triangular segment d-e-f of hexagon 38. When the doses from these triangular segments are integrated, the cumulative exposure dose anywhere in the overlapping region is the same as in the non-overlapping regions, thus producing a seamless, uniform exposure over the whole substrate.
We have described above the advantages of our prior-art hexagonal seamless scanning technique for projection imaging of a mask pattern to a substrate which has a flat surface that is also coplanar with the object field of the projection lens. The challenge addressed by this invention is to pattern on a surface which is neither coplanar with the object field nor flat
In order to illustrate the challenges of patterning on curved substrates, we first describe the underlying issues. We show in FIG. 4 the top surface of a substrate with an arbitrary curvature along one dimension and the flat image field of a conventional projection lens. The Rayleigh limit for the depth of focus (DOF) of a projection lens is determined by the wavelength of illumination λ and the numerical aperture (NA) of the projection lens, and is given by the following relation:
As an example, a projection lens designed for patterning 1 μm features using a 248 nm light source would typically have a 0.17 numerical aperture and the depth of focus for such a lens would be ±4 μm.
If we assume that the center of the image field is properly focused on the substrate as shown in FIG. 4, then, in order for the features everywhere in the image field to remain acceptably in focus, the curvature of the substrate must stay within the DOF of the projection lens. For a flat field, the allowed curvature of the substrate is determined by the size of the image field and by the DOF of the projection lens. We can show that the allowed radius of curvature R for the substrate is given by the expression:
where lh is the radius of the lens field in a conventional lithography system and, which, in the case of the seamless scanning systems described in the prior patents cited above, is also equal to the length of one side of the illumination hexagon. Equation (2) shows that a projection lens which has an 8 mm diameter field and which can image 1 μm features with a depth of focus of ±4 μm can pattern on a substrate with a radius of curvature of 1 meter. The above analysis illustrates how the maximum acceptable local curvature is calculated.
It must be emphasized that in previous systems the long-range departure of the substrate surface from planarity must still be within the DOF. The challenge addressed in this invention is how one may image on a surface whose long-range profile deviates more than the DOE limit.
As already mentioned, in order to keep the center of the image field in focus on the substrate at all times, the lithography system of this invention includes means for the substrate holder to be actuated along the z-direction during each scan. To determine the required z-motion so that the focal plane can be correctly placed, the system also includes a surface profile measurement capability. As shown in FIG. 1, a surface profilometer 15 is incorporated in the system; it determines the height variation while the substrate 1 is scanned so that the surface topography can be measured prior to moving the substrate in the z-direction. The topography information from the profilometer 15 is processed by a control system 8 which directs the set of motors 11-13 built into the substrate holder 10 of the scanning stage 3 to move the substrate 1 in the z-direction by the necessary amounts. The movements of the z-motors 11-13 and the scanning action of the stage 3 are synchronized so as to ensure that every point on the substrate 1 within the image field is within the depth of focus (DOF).
Additionally, we use a variable phase plate 14 to assist in moving the focal plane with respect to the substrate. FIG. 1 shows the variable phase plate 14 between the fold mirror 7 and the projection lens 5. Working in combination with the z-motors 11-13 in the substrate holder 10, the variable phase plate helps perform fine-tuning of the focus adjustment to accommodate the given curvature with the desired accuracy. This will be described in more detail later along with another complementary fine-tuning technique; both techniques can be implemented to obtain the desired accuracy in focal plane mapping.
The combined actions of the surface profilometer 15, the coarse z-positioning implemented by the substrate holder 10, and the fine-tuning of the focal plane are all performed synchronously to keep the focal plane properly situated with respect to the substrate 1. We show in FIG. 5 the optimum focal position for the image plane depending on the local topography of the substrate that is currently in the image field of the projection lens. If the local terrain of the substrate has a relatively constant slope as shown in FIG. 5(a), then the control system (8 in FIG. 1) will cause the center of the image field to focus on the surface of the substrate. If the local topography in the image field of the projection lens has a relative maximum near the center of the image field, then the system will focus the center of the image field below the surface of the substrate as shown in FIG. 5(b). FIG. 5(c) shows how the image field will be focused above the substrate if the substrate has a local minimum near the center of the image field.
Referring again to FIG. 1, during the course of a scan the substrate 1 will be moved up and down in real time as the substrate and mask are scanned in unison through the image field and object field, respectively, of the projection lens 5. In principle, the substrate can be moved up and down with enough speed and accuracy to track the profile changes as the scanning stage 3 moves the substrate through the lens image field. In practice, the z-motors 11-13 are used to follow only the coarse changes in the height of the substrate, and other means are implemented to perform the fine tuning. There are two different embodiments which we will describe that will allow the focal plane of the projection lens to track the fine changes of the substrate profile variation and to keep the substrate within the depth of focus. The first approach, as already briefly outlined above, is to use the variable phase plate 14 shown in FIG. 1, and the second approach is to tune the wavelength of the laser light source in the illumination system 4 to effectively shift the focal plane of the projection lens 5.
The variable phase plate 14 in FIG. 1 serves to change the location of the focal plane with respect to the substrate 1 by moving the focal plane of the projection lens 5 up and down in the vertical direction. The phase plate is in the imaging path between the projection lens 5 and the fold mirror 7. If the refractive index or the thickness of the phase plate is changed, the focal plane will shift. As an example, consider a variable phase plate (with refractive index=1.5) which is in the imaging path of a projection lens with a back focal distance of 200 mm. If we increase the effective length of the phase plate from 10 mm to 10.5 mm, the focal plane will shift by 167 μm. Similarly, if we change the index of refraction from 1.5 to 1.55, the focal plane will shift by 215 μm. The shift in focal length given in these examples is much larger than would be required in a lithography system that may be built in practice embodying this invention. The z-motion of the substrate holder 10 would provide the coarse movements that are needed, and the variable phase plate 14 would only enable fine adjustments. Therefore, the nominal thickness of the phase plate would be known prior to design of the projection lens, so that any aberrations that may be introduced by the plate can be compensated a priori in the design of the imaging system.
One technique to configure the variable phase plate is shown in FIG. 6. It uses a variable phase plate assembly consisting of two plates 14-1 and 14-2, each with a small wedge angle, which are moved relative to each other to effectively change the relative thickness of the assembly. It is also possible to use electro-optic techniques to vary the index of a bulk material, thereby changing the optical path length.
In another embodiment of the invention the technique used to vary the image plane of the projection lens 5 consists in exploiting both the inherent dispersion of the projection lens and the tuning ability of a narrow spectral bandwidth light source. For example, in FIG. 1, the light source 17 in the illumination system 4 can be a narrow bandwidth krypton fluoride (KrF) excimer laser which uses a line-narrowing module 19 consisting of an aperture and a diffraction grating assembly integrated with the laser system. The grating allows the user to tune the line-narrowed laser across the bandwidth of the KrF laser transition. We exploit this tuning ability for fine focus adjustments. A slight change in the wavelength of the illumination will result in a shift of the focal plane due to the dispersion of the projection lens 5. This can be done without any detrimental effect on the image quality. As an actual quantitative example, in a 1 μnm resolution projection lens that we designed and built using all fused silica elements, a 10 pm shift of the wavelength produced a 4 μm shift in the focal plane. Since the laser can be tuned across hundreds of picometers, this technique can be implemented to shift the focal plane by as much as 100 μm. This technique is also extremely sensitive and repeatable, and can be used in combination with the variable phase plate 14 to provide a finer adjustment of the focal plane. It can also be very fast since the wavelength is changed by tilting a grating through a small range of angles. Finally, it has the advantage that it does not introduce any additional elements into the imaging system.
In order to be able to move the substrate 1 and the image plane of the projection lens 5 to the correct z-position, it is important to be able to accurately characterize the surface profile of the substrate 1. This function is performed by the surface profilometer 15 shown in FIG. 1. The surface profilometer 15 consists of a non-contact sensing unit which is rigidly fixed on the same mechanical structure that holds the imaging system. The sensing unit relies on the same scanning motion of the stage 3 to move the substrate 1 under the head of the profilometer 15 as is used to pattern the substrate. The wavelength of the light source used in the sensing unit is outside the spectral range of photosensitivity of the substrate; for most photoresists which are sensitive in the UV, the detector light source can be a He—Ne laser emitting in the red. The sensing unit shown in FIG. 1 is displaced with respect to the imaging beam so that it measures the profile of the substrate 1 along a line which is centered along the imaging region of the next scan. In this manner, all the information required to actuate the substrate 1 is acquired before the exposure scan begins.
In the above embodiment it is necessary to perform an additional scan in order to read the height information for the first scan before beginning the patterning. An alternative approach is to position two different height-sensing units on either side of the imaging region such that the centers of the units and the image field are on a line which is parallel to the direction of the scan. In this approach, one sensing unit is used to detect the height of the substrate just before entering the image field when scanned in one direction, and the other unit is used when scanning in the opposite direction. There are several known techniques which can be used for height sensing, including optical triangulation devices, optical focusing systems, and confocal microscopy.
We next describe how we can decrease the allowable local radius of curvature of the substrate, e.g., below 1 m when patterned by an imaging system with an 8 mm field diameter and which is capable of resolving 1 μm lines and spaces. In this embodiment we use a non-planar image field which is varied to match the local topography of the substrate. This will enable the lithography system to accommodate a much higher degree of substrate curvature. Additionally, when the image field is matched to the substrate topography, very little of the DOF budget is utilized, making the lithography system much more robust from a process window point of view.
In principle, one technique that can be used to change the curvature of the image field is to incorporate some weak cylindrical optics into the projection lens which can be moved to change the curvature independently in X and Y. In practice, this would be difficult to implement without significantly affecting the imagery performance. If a substrate of known, fixed curvature is specified, such as for a wing section or a cockpit window of an aircraft, then the lens can be more easily designed to generate the permanently curved image field which best matches the profile of the substrate. In the most general case, when the curvature of the substrate is either variable or not known, such a technique would be difficult. However, using the embodiment we describe next, it is still possible to generate a curved image field to match the local surface topography of the substrate. As shown in FIG. 7, this is accomplished by replacing the fold mirror 7 in FIG. 1 with a deformable mirror 22 which serves to create an image field with the appropriate curvature so as to optimally match the curvature of the substrate 1.
FIG. 9 shows schematically how the typical system also comprises a mechanically stable base structure 24, on which the stage subsystem 3, 3-1 is mounted. Bridge structure 25, 25-1, 25-2 . . . 25-n is mounted to the base structure 24. The projection subsystem 5 is mounted to the bridge structure 25-2. The surface profiling means 15 is mounted to the bridge structure 25, 26 so as to have a constant locational relationship with the projection subsystem 5.
A deformable mirror consists of a thin reflective substrate which has an array of piezo actuators which serve to introduce small changes in the curvature of the reflective surface. We show in FIG. 8 a cross-section of such a mirror. The mirror surface 71 is deformed in real-time in response to the changing topography of the substrate surface to be patterned. The piezo-actuators 22-1, 22-2, . . . , 22-n move in response to the data collected by the surface profilometer 15 (FIG. 7) and received by the deformable mirror 22 through link 72 regarding the height variation of the region of the substrate 1 which is currently in the image field of the projection lens 5. As the stage 3 scans the substrate through the image field, each pulse of laser 17 sees a slightly different curvature of the deformable mirror surface 71 which has been programmed to match the substrate profile in the image field.
In summary, we have disclosed above several embodiments of a novel, high-resolution lithography system that is capable of high-speed patterning on large-area substrates that may be curved in one or more directions. The numerous advantages of the system of this invention over prior-art lithography tools can be summed up as follows:
(i) The ability to optimally adjust the curvature of the image field of the projection lens to match the surface topography of the substrate allows this lithography system to pattern on substrates with very high degrees of curvature. This advantage is further enhanced by the system's ability to exploit the nonlinear relationship between the image field of the projection lens and the allowed curvature of the substrate.
(ii) With its unique hexagonal exposure field and continuous scanning movement, the new system enables patterning of substrates of practically any desired size, eliminating field size constraints of conventional projection tools. Because of the hexagonal illumination configuration and maximum image field utilization, this system also delivers high throughputs using small-size optics modules, thus keeping system costs low.
(iii) With its seamless overlap between adjacent scans, critical stitching errors which are characteristic of conventional step-and-repeat tools, are eliminated. Due to its ‘batch’ exposure mode, the new system also eliminates the severe throughput limitations of focused-beam direct-write systems which expose pattern pixels in a serial fashion.
(iv) Being a projection system, it circumvents the traditional problems of contact printing tools, namely defect generation on the panel, degradation of the mask, cumbersome alignment process, and long vacuum pull-down times. It also eliminates the shortcomings of proximity printing tools, namely, limited resolution and feature size variations.
(v) The in-situ surface profilometry system measures the surface topography of the substrate on the fly and enables adjustment of the image focal plane with respect to the substrate in real-time to accommodate the substrate curvature.
(vi) The means to tip and tilt the substrate, the fine wavefront tuning by the phase plate and the deformable mirror provide the system with a fast, controlled and automatic capability to accommodate a wide range of substrate curvatures in arbitrary directions.
(vii) The desired resolution and substrate size handling capability can be delivered with off-the-shelf optical and mechanical components, thereby eliminating the need for development of complex and expensive lens systems and reducing commercialization risks. This also helps reduce system costs.
(viii) The modular design concept of the system disclosed in this invention permits rapid construction of the lithography system in different user-specified configurations, without requiring an entire new development program for each configuration. The modular design concept also provides upgradability. Unlike most other lithography tools, the major subsystems in the new system are mutually non-interfering and their performance can be taken to a higher level by upgrading the appropriate module without having to retool completely.
The invention describes a method of providing a high-throughput, high-resolution patterning system for large, roll-fed substrates using the following steps:
1. Providing a stage incorporating a substrate holder for holding a photosensitive substrate with a curved surface and a mask holder for holding a flat mask, and capable of scanning longitudinally in one direction, and also capable of moving laterally in a direction perpendicular to the scan direction;
2. Providing an illumination system which produces radiation of the wavelength and intensity required by the photosensitive substrate material, and which produces on the mask an illumination region in the shape of a regular hexagon of side lh which can be inscribed within the image field of the projection assembly described in step 3 below;
3. Providing a projection imaging assembly of magnification 1:1, which has an image field size that is substantially smaller than the substrate size, and which is designed to produce a 1:1 image of the illuminated region of the mask on the substrate with the required resolution;
4. Providing an optical reversing unit which, in conjunction with the projection assembly of step 3, helps produce an image on the substrate that is in the same orientation as the object pattern on the mask;
5. Providing a scanning surface profile measurement means capable of determining the topography of any selected region of the of the substrate prior to an exposure scan covering that region;
6. Providing actuators in the substrate holder capable of tipping and tilting the substrate, the actuators operating with input signals from the surface profile measurement system in such manner as to continually adjust the substrate to keep its surface optimally close to the image focal plane of the projection lens during the exposure sequence described in steps 8-10 below;
7. Providing phase-adjusting optical means in the imaging path for adjusting the curvature of the image wavefront so that, operating with input signals from the surface profile measurement system and working in conjunction with the substrate z-actuators, the image wavefront is optimally matched to the topography of the substrate during the exposure sequence of steps 8-10 below;
8. Scanning the stage so that the length of the mask traverses across the hexagonal illumination region described in step 2;
9. Stopping the stage momentarily after completion of a scan across the length of the mask, moving the stage by a distance of 1.5 Ih in a direction perpendicular to the scan direction, and resuming the scanning of the stage in a direction opposite to the scan direction in step 5;
10. Repeating steps 8 and 9 until exposure of the entire substrate is completed.
For additional precision in patterning, the method of operation may further include the step of periodically realigning the mask and substrate relative to each other during the steps 8-10 above.
In this section, we present an example of a system design based on this invention. We describe the design parameters, both optical and mechanical, for the system, and also discuss the hardware subsystems suitable for incorporating in the tool. Table 1 shows the specifications of a representative system that may be built based on this invention.
The projection system is a 1:1 magnification lens with a numerical aperture of 0.17 which will be capable of imaging 1.0 μm features with a depth of focus of ±4.0 μm. The lens image field size will be designed for 8 mm which will be capable of patterning surfaces with local radius of curvature within 1.0 meter over a 12×12 inch substrate. The light source in the illumination system is a krypton fluoride (KrF) excimer laser operating at a wavelength of 248 nm. Because of the difficulty in achromatization of a high-resolution projection lens at this wavelength, the lens assembly will incorporate only fused silica elements, and the laser will be spectrally line-narrowed and frequency-stabilized. The lens will be telecentric in both object and image spaces. This important feature minimizes distortion effects that could arise as a result of any defocus of the substrate from the ideal image plane.
The image train also includes a reverser and a variable phase plate. The reverser directs the rays from the mask into the projection lens and flips the image across the optical axis so that the pattern illuminating the substrate has the correct orientation for seamless overlapping exposures. The reverser system will be a split-roof configuration which consists of two mirrors oriented at right angles with respect to each other. The unit is tilted at 45 degrees with respect to the mask plane to direct the laser illumination into the projection lens. The variable phase plate will consist of two fused silica wedged plates capable of sliding with respect to each other to provide a movable image focal plane.
The beam delivery system serves to properly configure and deliver the output of the laser to the mask plane. It consists of three subassemblies: a beam shaping system, a homogenizer and a condenser system. The beam shaping unit is an anamorphic assembly, comprising cylindrical and spherical lenses, which converts the rectangle-like output of the laser to a square beam with roughly equal divergence in both axes. The beam propagates over the required distance to reach the homogenizer. Near the homogenizer entrance the beam passes through a focusing lens which determines the numerical aperture that is used to illuminate the mask and how the laser beam couples into the projection lens. This plays a significant role in determining the modulation transfer function of the imaging system and, consequently, its performance at different spatial frequencies.
The homogenizer is a reflective-type system that uses a hexagonal light tunnel constructed from high-reflectivity dielectric mirror strips. The homogenizer serves to uniformize the laser beam while preserving the numerical aperture determined by the beam shaping system. The condenser system projects the output of the homogenizer onto the mask. It consists of two or tree spherical lenses. All of the optics in the illumination and imaging systems are coated with high-damage-threshold dielectric coatings, anti-reflective for lens element surfaces and high-reflectivity for mirror surfaces. The total energy efficiency from the laser to the substrate is estimated to be about 50%.
The translation stage system will be an air-bearing X-Y stage mounted on a granite reference base, which in turn will be mounted on a vibration-isolated pneumatic chassis. It will be driven in both directions by linear, brushless, dc motors. The velocity of the stage will be at least 250 mm/sec. The range of travel of the stage will be chosen based on the required substrate dimensions. For a 17 inch diagonal substrate (12×12 inches), we would require a range of travel of about 14×13 inches; this includes the additional longitudinal distance needed for the stage to accelerate and decelerate beyond each scan length of constant velocity and the additional lateral distance needed for the beginning and ending scans.
The profilometer to measure the height variations of the substrate will be a dual-beam laser ranging device that will determine the substrate curvature by an optical triangulation technique. The z-actuators in the substrate holder to tip and tilt the substrate will comprise three fine-pitch, servo-controlled, brushless, DC stepper motors. The deformable mirror assembly will be an astronomical-type unit consisting of several dozen piezoelectric actuators which will be capable of deforming the mirror surface at multiple locations in controlled amounts so to, in conjunction with the actions of the substrate holder z-actuators and the variable phase plate, optimally match the substrate curvature.
To demonstrate the attractive throughput of the lithography system disclosed in this invention, we present the following analysis based on realistic parameters. We use the projection lens assembly described above, with its design resolution of 1 μm and an image field diameter of 8 mm. The length of a side of the hexagonal exposure field, lh, is half of the image field diameter. Thus,
The effective scan width w, as defined previously, is then
w=1.5l h=6 mm.
If the scan speed is vs, then the raw exposure throughput (i.e., without taking into account any non-exposure overhead time), defined as the area A exposed per unit time, is given by
The appropriate scan speed is determined by the resist sensitivity and the available exposure intensity on the substrate. We use a resist sensitivity of
with the remark that many commonly used resists in representative thicknesses are often exposed with much lower doses. To estimate the UV power incident on the panel, we use a conservative value of η=50% for the net optical efficiency of the optical train. This gives a value of 2.5 W for the power incident on the panel. For the above combination of hexagonal image field size, resist sensitivity and incident power, the stage can be used at speeds up to 25 cm/sec.
The raw exposure throughput then can be estimated to be
The final important parameter that enters the throughput calculation is toh, the total overhead time per panel, which includes the load, unload and alignment times. Using toh=10 sec and a scanned exposure area of 12×12 inches per panel, the net throughput can be estimated to be
We remark that, in comparison with currently available lithography tools, not only is the throughput that we have just calculated several times greater, but is also for patterning on curved surfaces, which cannot be accomplished with present tools.
1:1 magnification telecentric refractive lens
1.0 μm @ k1 = 0.7
Depth of Focus
Lens Image Field Size
8 mm diameter
Substrate Size Capability
300 × 300 mm (12 × 12 inches),
extendible to larger areas
Krypton Fluoride Excimer Laser
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|U.S. Classification||355/53, 355/55, 355/86, 355/47|
|Cooperative Classification||G03F7/703, G03F7/70266, G03F7/70791, G03F7/70358, G03F7/70725|
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|Oct 22, 1998||AS||Assignment|
Owner name: ANVIK CORPORATION, NEW YORK
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:JAIN, KANTI;FARMIGA, NESTOR O.;DUNN, THOMAS J.;REEL/FRAME:009543/0990
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text:
PAUL KELLY HARMONICA by HOHNER
This is the Paul Kelly Signature Harmonica from Hohner!
The Paul Kelly Signature Harmonica is a Marine Band model in the key of C and features Paul’s signature Laser etched on the cover plate and printed on the box.
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The Marine Band is Hohner’s most popular Harmonica. Made in Germany, the timeless Marine Band is also known as the 1896/20 for the year it was introduced and for its twenty reeds. The Marine Band is also the basis for a number of Hohner’s Diatonic harmonicas such as the Cross Harp, Special 20 and the Blues Harp.
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Built in strictly limited numbers the Paul Kelly Signature Harmonica Hohner is sure to sell out…before too long!

domain: hobby


text:
Last year, Chinese market researchers Redpulse launched one of the most interesting cryptocurrencies in the world. And it’s growing. Fast. The Redpulse (RPX) token experienced a slow start from its release on October 8th, 2017, but in the last 24 hours the value of the coin has skyrocketed to $0.71; an increase of 61.45%.
Let’s have a look behind the scenes. The Hong Kong-based firm have made leaps and bounds in securing their place in the market research arena, and have been providing information to investors, traders and advisors since 2014. It’s well known that the Chinese economy is one of not only the largest but fastest-growing in the world; a combination that makes it very enticing for investors. It’s no surprise that Redpulse has partnered up with the likes of Bloomberg and Thomson Reuters to distribute their intelligence.
But where does all of this tie into cryptocurrency? Many businesses are seeing the benefits of developing one of their own or are considering trading in another, simply because of the glaring benefits provided by the very nature of an online coin; extremely low-cost transactions in a secure environment, records of which are transparent and publicly verifiable. But Redpulse’s ambitions lie a little higher than that.
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Featured Image: twitter

domain: finance


text:
We have yet to find a lady from down under we don’t love. Today it’s model/actress/paparazzi favorite Sophie Monk. We ask her about her latest flick, her best advice for having a kickass summer and, of course, how to romance a hot Aussie …
Natalie Suliman shows of a hot, hot pink bikini for M&S swimwear.
Miss Bikini Luxe Fashion Show during the Milan Fashion Week
Bai Ling poses in a white bikini.
Adriana Lima struts her stuff on the runway for Vicky’s Secret.
Things on the runway get a little hot this summer at the Miami Swim 2010 fashion show.
The Swim Group Collection Show in Australia showcases new swimsuits on sub-equatorial girls.
Cameron Diaz hangs two on the set of Charlie’s Angels in a white bikini. Images via Getty.
Holly Madison hosts the world’s biggest pool party at The Wynn in Las Vegas. Images via Getty.
Did you ever think CNBC would be a lot more interesting if they replaced each grumpy and aging business reporter with a couple of fine biz babes? Oh wait, that …

domain: entertainment


text:
A photo from open sources
The secrets of the Egyptian pyramids have been haunting the minds for centuries researchers and all those interested in Ancient Egypt. Especially a lot of puzzles hide the three pyramids that are located in Giza, not far from present Cairo. On a rocky plateau deserts they stand, casting clear shadows on the sand, – three huge geometric bodies, impeccably regular tetrahedral pyramids, which are considered to be the tombs of the pharaohs of Cheops, Chefren and Mycerin. The largest of them – the Cheops pyramid (Khufu) – is called Great pyramid. In 1864, astronomer Charles Piazzi Smith put forward the assumption that the Cheops pyramid was built to translate into In this form, a number of aspects of ancient, very perfect knowledge. At followers appeared trying to unravel the mystery of this Egyptian pyramids. There was an assumption of uniqueness Cheops pyramids among other monuments of ancient Egypt. His supporters argued that it was built by the will of a higher mind aliens from worlds with more perfect than on earth, civilization. It was assumed that in the design of the pyramid, its the parameters are encrypted ancient prophecies that subsequently formed the basis of the Old Testament, predetermined the future history Christianity and predict the second coming of Christ. When measuring the very pyramid of Cheops it turned out that the perimeter of the pyramid of Giza, divided by double height, gives the exact number “Pi”, with accuracy to one hundred thousandth. Interestingly, a sacred measure of the length of Egypt, those. pyramidal inch (oddly equal modern English) there is one billionth of the Earth’s orbit, passed by her in 24 hours. The sum of the two diagonals of the Egyptian pyramid, expressed in inches, gives the number of years during which the northern the pole of our earth makes one complete revolution. Pyramid volume multiplied by the specific gravity of the stone of which it is made, gives theoretical weight of the globe, etc. Now there are many theories about how these Egyptian pyramids were built. According to by some authors, the Cheops pyramid was built by aliens; by versions of others, blocks were transferred to their places using magic crystal. In the 1980s, Robert Buvel, Belgian civil engineer, drew attention to the stellar analogue of the circuit mutual arrangement of the pyramids of Giza. Relative arrangement three stars in the constellation Orion, forming a kind of belt at the waist human figure, exactly repeats the layout of three The largest pyramids on the Giza plateau. Great pyramid and similar the size of Chefren’s pyramid take the place of the two brightest stars the belt of Orion, Al-Nitak and Al-Nilam, and the smaller pyramid of Menkaur offset from the axis of two neighboring, just like the third and smallest the star of the belt is Mintaka. Such an obvious analogy threw a straight line a challenge to orthodox archeology, arguing that religion is at the core the Egyptians lay worship of the sun, not the starry sky. However It was, the presence of the phenomenon is impossible to deny. Graham Hancock, author Traces of the Gods, working on an alternative interpretation history of the ancient world, believes that the observation of Buvel allows dating the pyramids is by no means 2500 BC. e., and about 10,450 BC e., when the outline of the belt of Orion is exactly corresponded to the arrangement of the pyramids. Pyramids – one of numerous evidence in favor of the existence of that long the era of some advanced civilization. Meanwhile, the specified era fits into the time frame of the legendary Atlantis, although no one undertakes to claim that built the early pyramids civilization really was the Atlantean civilization. Interesting data cited by American scientist John Anthony West, who drew attention that at two objects – the Sphinx and the Temple of the valley, located at a distance of several hundred meters from each other, There are distinct traces of severe water erosion. Giant figure Sphinx is located in a hollow of a steep slope, made of rock whom she was carved. Such a hollow is very fast filled with sand, and the likelihood that in arid conditions Desert sand was washed away by rain, extremely small. But it was not always. Sahara area began to turn into a sandy desert only at the end of the last ice age, and another 12,000 or even 10,000 years ago there was quite abundant rainfall, which could cause West erosion. West’s observations were recognized by almost 300 geologists, participants Congress of the American Geological Survey society. The construction of the pyramids was such a large-scale enterprise, required such efforts from the entire community, such costs temporary and material resources that must exist serious reasons for their construction. The fact of construction was to bring to the community the favor of the gods in one or its other form. Ancient sources have no shortage of evidence of fireballs falling from the blaze, incinerating and burning everything around. It may well be that erecting pyramids at different points of the globe, people wanted to ask higher powers to stop the destruction of civilization and cease to bring down flaming from heaven blocks. Another mystery of the Egyptian pyramids is that two the largest pyramids were built, apparently, in two steps. After the start of construction, for some reason, the work stopped and renewed much later. Why did you make such a conclusion? AND engineering logic and common sense suggest that as the pyramid increases, the size of the limestone blocks should to decrease. But during the construction of the Great Pyramid, for example, in the first 18 rows of blocks are really gradually reduced in size, and to 18 row each weight does not exceed several tons. However, already at 19 a number of masonry blocks again increase sharply in size, although they are already had to raise to a height of over 30 meters! Why? Here not all the secrets and mysteries of the Egyptian pyramids are listed. Yet for a long time they will excite people, prompting new research.

domain: history


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Macquarie Group has paid $6 million to settle a five-year legal dispute with Ballarat businessman Brendan James who accused its investment advisers of artificially inflating the price of a small mining company and encouraging him to buy more shares when it proved to be worthless.
An adviser at the nation’s largest investment bank then sold stock held by family members and favoured wealthy clients before the share price collapsed.
Macquarie also agreed to pay $1 million towards Mr James’ legal fees, but refused to make any admissions about its brokers’ conduct under a confidential deal finalised in March.
Mr James lost about $4 million with Macquarie Private Wealth after his late brother-in-law, former St Kilda captain and Richmond coach Danny Frawley, recommended in 2010 that he invest the proceeds from the sale of his crane company with the bank known as the “millionaires’ factory”.
More here – The Sydney Morning Herald
PS: What amazes me is that this sort of behaviour was going on when I was involved in broking so it seems that despite changes in regulation little can be done to change the behaviour of some in the industry.


Nneoma Ugwu Awarded Helene M. Overly Scholarship
Nneoma Ugwu, a doctoral student in civil and environmental engineering at the University of Maryland, has been named the 2020-2021 recipient of the Women’s Transportation Seminar (WTS) Helene M. Overly Memorial Scholarship.
This international scholarship, awarded annually to one graduate student, aims to encourage women to pursue career paths in transportation.
“I am so honored and excited to be awarded the Helen M. Overly International Memorial Scholarship by WTS,” Ugwu said. “This scholarship will go a long way in supporting my research on the impacts of Covid-19 on transportation as I explore the potential benefits of continued teleworking in order to assist policymakers in their decisions.”
During the past year, Ugwu has been conducting a study designed to quantify how reductions in traffic due to teleworking impact congestion—a topic inspired by changes to traffic patterns arising from the COVID-19 pandemic. Research by the Maryland Transportation Institute has revealed that as little as a 15% reduction in traffic translates into nearly free-flow on otherwise very congested roadways.
Ugwu is researching the broader impacts of this finding, including how lower traffic volumes affect individual roadway segments, planned projects, and tolled facilities. In addition, she is examining equity issues around how reductions in roadway volumes impact low-income communities, and what longer-term trends might emerge if the reductions continue.
“She is able to work from the basic single project to the larger system in which the project operates. This is truly a valuable skill,” said Clark Distinguished Chair Deb Niemeier, Ugwu’s advisor.
Ugwu said her interests as a researcher have been shaped by experiences in her native country, Nigeria.
“My passion for transportation stems from experiencing firsthand the crippling effect of poor transportation systems and planning on a nation’s economy and growth. I’m so happy that my dedication to providing equitable transportation systems and using transportation as a tool to alleviate poverty is being recognized,” she said.
“I hope my work and successes encourage more diversity especially for women in the world of transportation,” she said.
Published May 4, 2021


Knives out among BJP, Akalis over Jaitley defeat
5 Dariya News
Chandigarh , 19 May 2014
The knives are out among leaders of Punjab's ruling alliance, the Shiromani Akali Dal and the Bharatiya Janata Party, over the defeat of senior BJP leader Arun Jaitley from the Amritsar Lok Sabha constituency.In the latest salvo, Akali Dal legislators have questioned BJP legislator and chief parliamentary secretary Navjot Kaur for her outburst against Revenue Minister and local Akali Dal lawmaker Bikram Singh Majithia over Jaitley's defeat.Navjot Kaur, the wife of outgoing Amritsar MP, cricketer-turned-politician Navjot Singh Sidhu, had blamed Majithia's over-confidence for Jaitley's loss.Akali Dal legislators Harmeet Sandhu, Virsa Singh Valtoha, Manjit Singh Manna and Baljit Singh Jalalusma, in a statement Monday, urged Navjot Kaur "to introspect on her actions before pointing fingers at senior leader and Revenue Minister Bikram Singh Majithia".They said it was Navjot Kaur "who had disowned the coalition dharma by airing her grudges in the media instead of at party forums".The legislators asked her to explain how Jaitley lost by 32,000 votes in her Amritsar East assembly segment. They wondered whether her popularity graph had gone down by so much or whether there was a mischief to ensure Jaitley's defeat and embarrass the ruling alliance.They said she could not point fingers at others, especially Majithia, the brother-in-law of Punjab Deputy Chief Minister and Akali Dal president Sukhbir Singh Badal.Jaitley lost to former Punjab chief minister and Congress candidate Captain Amarinder Singh by over one lakh votes. Jaitley is the senior-most BJP leader to have lost anywhere in the country while others in the party benefitted from the pro-Narendra Modi wave.Sidhu, who won the Amritsar seat in 2004, 2007 (by-election) and 2009, was replaced this time by the BJP with Jaitley without assigning any reason for his (Sidhu's) ouster.


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My favorite is eating strawberry jelly with fresh white bread. I like this brand because there is pieces of fruit in the jelly. I only have used it as a sandwich spread. It doesn't cost much but it last a long time. I am always satisfied when I buy this product.
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The strawberries made my mouth explode with flavor that can only be described as an intense fruity sensation of maximal proportions. I highly recommend this product to any peanut butter and jelly connoisseur.
Unless you are picking the berries yourself and preserving them, this is the best stuff since sliced bread! I think it is a great value and a delicious treat. If I am eating PB and J, you can sure that this is spread on my sandwich. It is available in most grocery stores.
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Smuckers Strawberry Preserves are my all time favorite kind of jam. I love it on toast, muffins, biscuits, and bagels with cream cheese. It is delicious baked inside homemade cornbread muffins. It is always modestly priced for what you get.

domain: food


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Dr. Craig Santos Perez has become the first native Pacific Islander to win the Lannan Foundation Literary Fellowship for Poetry.
"I never thought my poetry would circulate, or be recognized, at a national level,” Perez, who received a 2016 fellowship, told NBC News. “I hope this signals a turn of attention towards Pacific Islander poetry by American readers and literary organizations. This is especially important now, with the threats of militarism, colonialism, capitalism, and environmental injustice impacting the Pacific region."
The fellowship is awarded by the Lannan Foundation, which is dedicated to "cultural freedom, diversity, and creativity" and supports established and emerging writers and artists. Candidates for the fellowship are selected by an anonymous network of writers, scholars, editors, and publishers, with a final decision made by the foundation's literary committee.
Perez is native Chamorro originally from Guam and is currently an associate professor in the English department at University of Hawai‘i, Mānoa, as well as affiliate faculty in the school's Center for Pacific Islands Studies and Indigenous Politics Program. He is also a co-founder of Ala Press, co-editor of two anthologies of poetry, co-star of a poetry album, and author of three poetry books.
Perez’ third book, “from unincorporated territory [guma’],” won an American Book Award in 2015, and his second book, “from unincorporated territory [saina],” won the inaugural PEN Center USA/Poetry Society of America Poetry Award in 2011.
"Reading Pacific poetry is especially important now considering the threats facing the islands today,” Perez said. “Guam and Hawaiʻi are experiencing major military activity due to rising tensions between the U.S., China, Russia, and North Korea. Many islands in Micronesia, such as the Marshalls and Kiribati, are being inundated by rising sea levels. Throughout the Pacific, extractive capitalism (from deep sea mining to industrial fishing) and climate change are endangering human and animal habitats. Pacific poets are vital voices [raising] awareness about these issues."
Perez plans to use the residency associated with the fellowship to complete his next book of poetry, which will be a collection focusing on nature, ecology, environmental injustice, climate change, and food.
Other 2016 Lannan fellows, all in poetry, include Don Mee Choi, Solmaz Sharif, and Ocean Vuong.

domain: literature


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5 people in one neighbourhood share their experiences
Sanctioning doesn’t work, says new research. Here, those affected share their stories.
What traps people in food poverty? What can unlock it?
What is it that traps people in food poverty? What can help to unlock it?
What’s the key that will unlock food poverty? We asked eight people with personal insights
This church listens to us – so should the politicians
I just cannot keep up with the costs
“I’ve been on this estate for 18 years but never knew what was happening in here”
“I don’t know how they expect me to get by with no money”
Arthritis forced Anita to stop work and she says cuts have been drastic


Every day local men and women put themselves on the line to protect the lives of others. It's their job, but that's not to say they couldn't use any help.
Donations to the Roswell FireFighters Foundation and the Roswell Police Public Contribution Fund go to assist these brave men and women during their time of need or emergency, if or when it may arise.
- For more information about the Roswell FireFighters Foundation and to learn more about what local firefighters do, visit the website. To donate to the foundation you may use Paypal, or mail a check to: Roswell Fire Department, c/o Deputy Chief Tony Papoutsis, 1810 Hembree Road, Alpharetta, GA 30009. Call Papoutsis for more information at 770-594-6231 (office) or 678-410-6706 (cell).
- Donations to the "Police Public Contribution Fund" may be sent to either Vicky L. Skinner or Chief Dwayne Orrick at: 39 Hill Street, Roswell, GA 30075. For more information, call 770-640-4213.


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Dr Rachael Mbabazi said the institution needs medicine to treat the ailing animals, control their birth and protect the human to animal transfer of diseases....
Muhumuza added that clubfoot is a common type of birth defect that affects muscles and bones in the feet. Instead of being straight, a clubfoot points...
Uganda Tourism Board (UTB) says the promotion of domestic tourism ought to be exploited at this time.
The army will take charge of security in Kampala, Mukono, Wakiso, Entebbe, and the entire country.
The road being one of its kind in Uganda, many drivers are not well-versed with it leading to several accidents.
The three-storey facility, built by the SFC construction unit, cost shs3.48b. Initially, an external contractor had quoted sh9b, according to a release...
Mukula’s sentiments followed accusations from Entebbe leaders that Njuki supports opposition candidates in Entebbe municipality.
During the meeting, the two leaders discussed issues of mutual interest between their two countries.
"We have a QR app on our mobile phones, which we use to authenticate all the results presented to us,"
CCCC has already provided machines and the necessary equipment to start renovating the ground
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This 46' foot flybridge cruiser has been designed for exploring Indonesian waters, She is Indonesian flagged and could easily be put to work and start generating income for you.
Step on board and you'll notice the huge size of the aft deck offering a large and versatile space for entertaining, relaxing and taking in your stunning surroundings. Moving into the saloon there is a comfortable L-Shaped sofa, open plan galley, a dining table that can seat eight people and ample room for entertaining.
The well equipped helm is located on the upper deck in a well protected fly bridge which offers great visibility and privacy between the captain and guests. There is a VIP cabin forward with a double bed a twin cabin on the port side, each cabin has an ensuite toilet.
She was recently painted and refitted from top to bottom. There are 2 Mooring, abundant spare parts and accessories that are included with the vessel.


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Restored manse in Marshfield to host weekly music performances
Musicians Tim Archer and Ricky Lee have restored the nearly 200-year-old building
A nearly 200-year-old manse in Marshfield, P.E.I., has been lovingly restored by two musicians who plan to welcome people into the home for weekly performances.
"We've always wanted to open our home, to make it feel like home to anyone who enters. I think it's a great tribute for a building that was really set to be demolished within the next few months," said Tim Archer, who restored the manse with his partner, musician Ricky Lee.
The Music at the Manse performances will feature a range of music, including gospel and rock and roll.
Manse had been deteriorating
Archer says the manse was originally built in 1830. While in many ways he says it has stood the test of time, he says there has also been deterioration over the years.
"It was sad to walk into a place with 12-foot ceilings, three fireplaces, hardwood floors all throughout, fabrics imported from Italy on the walls; to see everything in shreds and the house caving in the middle."
Archer and Lee have been hard at work breathing new life into the space — including painting tin ceilings and sewing drapes themselves.
They have set up a room as a performance space, which can hold up to 24 people. They plan to start hosting Friday night performances in January.
Small, intimate performances
Leading up to the new year, they held a few "test ceilidhs" in early December.
They've had a lot of positive feedback, and heard from a lot of people who are interested in attending. They are considering also using the adjoining dining room, which is connected by a large archway. But, they say, they want to keep the experience intimate.
"It's an up close personal experience," Lee said.
"You don't just go and sit in a chair and watch someone on a stage perform. The rooms are small enough and intimate enough to where Tim and I can interact with the audience on a one-to-one basis," said Lee.
More P.E.I. news
With files from Mainstreet P.E.I.


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The strategic focus and goals of the Foundation are to:
Conduct appropriate pre-clinical and clinical research experiments leading to international presentations and publications that convey new learning’s about the mechanisms and treatment of Burkitt Lymphoma.
Facilitate international exchange and collaboration of existing pre-clinical and clinical data sets among academic and private research centers.
The Foundation for Burkitt Lymphoma Research has established a collaborative effort with the National Cancer Institute (NCI), in order to develop a genomic databank for Burkitt Lymphoma. The Burkitt Lymphoma Genome Sequencing Project (BLGSP) will compile genetic changes present in BL tumors, analyze the data to identify diagnostic, prognostic, or therapeutic markers or targets, and publish the results. As with other cancer sequencing projects, the goal is to identify potential genetic changes in patients with BL that could lead to better prevention, detection and treatment of the cancer.

domain: biology